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Die Internationale Marke ENVOSYS wurde als Wortmarke am 16.01.2015 bei der Weltorganisation für geistiges Eigentum angemeldet.
| Markenform | Wortmarke |
| Aktenzeichen | 1250056 |
| Registernummer | 302014004981.3/11 |
| Länder | 
|
| Basismarke |
Nr. 30 2014 004 981.3/11,
19. November 2014
|
| Anmeldedatum | 16. Januar 2015 |
| Ablaufdatum | 16. Januar 2025 |
Markeninhaber
Johannes-Schmid-Str. 3
89143 Blaubeuren
DE
89143 Blaubeuren
DE
Markenvertreter
Krenkelstraße 3
01309 Dresden
DE
Waren und Dienstleistungen
07
Installations consisting of machines for processing
semiconductors, in particular for processing semiconductors
under vacuum; installations for conveying semiconductors,
the installations consisting of appliances for conveying
goods; installations and systems for the surface treatment
of semiconductors, the installations and systems consisting
of machines for processing semiconductors; installations and
systems for etching semiconductor surfaces, the
installations and systems consisting of appliances for
processing semiconductors; installations for vaporising
semiconductor surfaces, in particular under vacuum (CVD
processes), the installations consisting of machines for
processing semiconductors; installations consisting of
machines for providing semiconductors, namely automatic
feeding devices, automatic loading and unloading facilities
and facilities for inserting semiconductors; installations
consisting of machines for conveying or processing of
photoelectric elements; installations consisting of machines
for providing photoelectric elements, namely automatic
feeding devices, automatic loading and unloading facilities
for inserting photoelectric elements; installations
consisting of machines for conveying or processing flat
screens; installations consisting of machines for providing
flat screens, namely automatic feeding devices, automatic
loading and unloading facilities and facilities for
inserting flat screens
09
Hardware and software for operating systems and
installations for the thermal treatment of surfaces and
objects, or for thermal processes for modifying surfaces, in
particular semiconductor surfaces, including diffusion
furnaces, continuous furnaces, installations for vaporising
semiconductor surfaces, burn-in ovens, vacuum furnaces;
hardware and software for operating systems and
installations for cleaning gases and exhaust gases,
including flue gas purification equipment
11
Systems and installations for thermal pre-treatment
processes or manufacturing processes, namely diffusion
furnaces, continuous furnaces, coating ovens, burn-in ovens,
vacuum furnaces; installations consisting of separators for
chemical vapour deposition, in particular under vacuum
conditions (CVD processes); installations for processing and
cleaning gases and exhaust gases; facilities for emitting
exhaust gases into the environment, the facilities
consisting of flues and installations for emitting exhaust
gases to the environment; gas flares; sewage purification
installations; sewage purification apparatus; sewage
disposal installations
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 06. April 2023 | 2023/15 Gaz | US | RAW: Total Invalidation |
| 25. September 2017 | 2017/41 Gaz | IN | RAW: Rule 18ter(2)(i) GP following a provisional refusal |
| 05. September 2016 | 2016/37 Gaz | KR | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 03. September 2016 | 2016/37 Gaz | TR | Ablehnung |
| 23. Mai 2016 | 2016/22 Gaz | CH | Ablehnung |
| 28. April 2016 | 2016/23 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 26. April 2016 | 2016/22 Gaz | RU | Ablehnung |
| 05. April 2016 | 2016/22 Gaz | EM | Ablehnung |
| 04. April 2016 | 2016/18 Gaz | IN | Ablehnung |
| 09. März 2016 | 2016/18 Gaz | CN | Ablehnung |
| 03. März 2016 | 2016/10 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 15. Januar 2016 | 2016/3 Gaz | NO | Ablehnung |
| 14. Januar 2016 | 2016/5 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 03. Dezember 2015 | 2015/49 Gaz | KR | Ablehnung |
| 05. November 2015 | 2015/45 Gaz | JP | Ablehnung |
| 10. September 2015 | 2015/37 Gaz | AU | Ablehnung |
| 08. September 2015 | 2015/38 Gaz | SG | Ablehnung |
| 17. Juni 2015 | 2015/25 Gaz | US | Ablehnung |
| 16. Januar 2015 | 2015/21 Gaz | DE | Eintragung |
ID: 141250056