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The International trademark ENVOSYS was filed as Word mark on 01/16/2015 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1250056 |
| Register number | 302014004981.3/11 |
| Countries | 
|
| Base trademark |
No. 30 2014 004 981.3/11,
November 19, 2014
|
| Application date | January 16, 2015 |
| Expiration date | January 16, 2025 |
Trademark owner
Johannes-Schmid-Str. 3
89143 Blaubeuren
DE
89143 Blaubeuren
DE
Trademark representatives
Krenkelstraße 3
01309 Dresden
DE
goods and services
07
Installations consisting of machines for processing
semiconductors, in particular for processing semiconductors
under vacuum; installations for conveying semiconductors,
the installations consisting of appliances for conveying
goods; installations and systems for the surface treatment
of semiconductors, the installations and systems consisting
of machines for processing semiconductors; installations and
systems for etching semiconductor surfaces, the
installations and systems consisting of appliances for
processing semiconductors; installations for vaporising
semiconductor surfaces, in particular under vacuum (CVD
processes), the installations consisting of machines for
processing semiconductors; installations consisting of
machines for providing semiconductors, namely automatic
feeding devices, automatic loading and unloading facilities
and facilities for inserting semiconductors; installations
consisting of machines for conveying or processing of
photoelectric elements; installations consisting of machines
for providing photoelectric elements, namely automatic
feeding devices, automatic loading and unloading facilities
for inserting photoelectric elements; installations
consisting of machines for conveying or processing flat
screens; installations consisting of machines for providing
flat screens, namely automatic feeding devices, automatic
loading and unloading facilities and facilities for
inserting flat screens
09
Hardware and software for operating systems and
installations for the thermal treatment of surfaces and
objects, or for thermal processes for modifying surfaces, in
particular semiconductor surfaces, including diffusion
furnaces, continuous furnaces, installations for vaporising
semiconductor surfaces, burn-in ovens, vacuum furnaces;
hardware and software for operating systems and
installations for cleaning gases and exhaust gases,
including flue gas purification equipment
11
Systems and installations for thermal pre-treatment
processes or manufacturing processes, namely diffusion
furnaces, continuous furnaces, coating ovens, burn-in ovens,
vacuum furnaces; installations consisting of separators for
chemical vapour deposition, in particular under vacuum
conditions (CVD processes); installations for processing and
cleaning gases and exhaust gases; facilities for emitting
exhaust gases into the environment, the facilities
consisting of flues and installations for emitting exhaust
gases to the environment; gas flares; sewage purification
installations; sewage purification apparatus; sewage
disposal installations
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| April 6, 2023 | 2023/15 Gaz | US | RAW: Total Invalidation |
| September 25, 2017 | 2017/41 Gaz | IN | RAW: Rule 18ter(2)(i) GP following a provisional refusal |
| September 5, 2016 | 2016/37 Gaz | KR | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| September 3, 2016 | 2016/37 Gaz | TR | Rejection |
| May 23, 2016 | 2016/22 Gaz | CH | Rejection |
| April 28, 2016 | 2016/23 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| April 26, 2016 | 2016/22 Gaz | RU | Rejection |
| April 5, 2016 | 2016/22 Gaz | EM | Rejection |
| April 4, 2016 | 2016/18 Gaz | IN | Rejection |
| March 9, 2016 | 2016/18 Gaz | CN | Rejection |
| March 3, 2016 | 2016/10 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| January 15, 2016 | 2016/3 Gaz | NO | Rejection |
| January 14, 2016 | 2016/5 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| December 3, 2015 | 2015/49 Gaz | KR | Rejection |
| November 5, 2015 | 2015/45 Gaz | JP | Rejection |
| September 10, 2015 | 2015/37 Gaz | AU | Rejection |
| September 8, 2015 | 2015/38 Gaz | SG | Rejection |
| June 17, 2015 | 2015/25 Gaz | US | Rejection |
| January 16, 2015 | 2015/21 Gaz | DE | Registration |
ID: 141250056