MASKTRACK

USPTO USPTO 2005 PARTIAL SECTION 71 ACCEPTED

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Die US-Marke MASKTRACK wurde als Wortmarke am 27.10.2005 beim Amerikanischen Patent- und Markenamt angemeldet.
Sie wurde am 16.09.2008 im Markenregister eingetragen. Der aktuelle Status der Marke ist "PARTIAL SECTION 71 ACCEPTED".

Markendetails

Markenform Wortmarke
Aktenzeichen 79018668
Registernummer 3501917
Anmeldedatum 27. Oktober 2005
Veröffentlichungsdatum 01. Juli 2008
Eintragungsdatum 16. September 2008

Markeninhaber

Schleissheimer Str. 90
85748 Garching
DE

Markenvertreter

Waren und Dienstleistungen

7 Industrial production machines for the manufacturing of substrates, namely, semiconductor substrates, silicon chips, wafers, and glass and ceramic substrates; and structural parts thereof; industrial production machines for wet-chemical and dry treatment of substrates, namely, semiconductor substrates, silicon chips, wafers, glass and ceramic substrates; and structural parts thereof; fully automatic industrial production machines for cleaning, lacquering, developing, etching and stripping substrates, baking, dying and treatment by IN, visible, or IR light irradiation of substrates, namely, semiconductor substrates, silicon chips, wafers, glass and ceramic substrates, and structural parts thereof; semiautomatic industrial production machines for the treatment of substrates, namely, manual insertion and removal apparatus for cleaning, lacquering, developing, etching and stripping substrates, baking, drying and treatment by IN, visible, or IR light irradiation of substrates, namely, semiconductor substrates, silicon chips, wafers, photo masks, glass and ceramic substrates, and structural parts thereof
37 [ Installation, maintenance, repair, process adjustment and optimization of mechanical apparatus for the manufacturing of substrates, namely, semiconductor substrates, silicon chips, wafers, photomasks, glass and ceramic substrates, and parts thereof; installation, maintenance, repair, process adjustment and optimization of machines for wet-chemical and dry treatment, and semiautomatic apparatus, and manual insertion and removal apparatus for cleaning, lacquering, developing, etching, stripping, baking, drying and treatment by UV, visible, or IR light radiation of substrates at the customers location ]
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ID: 1379018668