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The US trademark MASKTRACK was filed as Word mark on 10/27/2005 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 09/16/2008.
The current status of the mark is "PARTIAL SECTION 71 ACCEPTED".
| Trademark form | Word mark |
| File reference | 79018668 |
| Register number | 3501917 |
| Application date | October 27, 2005 |
| Publication date | July 1, 2008 |
| Entry date | September 16, 2008 |
Trademark owner
Schleissheimer Str. 90
85748 Garching
DE
85748 Garching
DE
Trademark representatives
goods and services
7
Industrial production machines for the manufacturing of substrates, namely, semiconductor substrates, silicon chips, wafers, and glass and ceramic substrates; and structural parts thereof; industrial production machines for wet-chemical and dry treatment of substrates, namely, semiconductor substrates, silicon chips, wafers, glass and ceramic substrates; and structural parts thereof; fully automatic industrial production machines for cleaning, lacquering, developing, etching and stripping substrates, baking, dying and treatment by IN, visible, or IR light irradiation of substrates, namely, semiconductor substrates, silicon chips, wafers, glass and ceramic substrates, and structural parts thereof; semiautomatic industrial production machines for the treatment of substrates, namely, manual insertion and removal apparatus for cleaning, lacquering, developing, etching and stripping substrates, baking, drying and treatment by IN, visible, or IR light irradiation of substrates, namely, semiconductor substrates, silicon chips, wafers, photo masks, glass and ceramic substrates, and structural parts thereof
37
[ Installation, maintenance, repair, process adjustment and optimization of mechanical apparatus for the manufacturing of substrates, namely, semiconductor substrates, silicon chips, wafers, photomasks, glass and ceramic substrates, and parts thereof; installation, maintenance, repair, process adjustment and optimization of machines for wet-chemical and dry treatment, and semiautomatic apparatus, and manual insertion and removal apparatus for cleaning, lacquering, developing, etching, stripping, baking, drying and treatment by UV, visible, or IR light radiation of substrates at the customers location ]
ID: 1379018668