9
[ Software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies; ] master substrates for high-resolution and ultra high-resolution replication technologies, namely, semiconductors, quartz and glass for use in patterning at nano scale or near nano scale; reference standards, namely, measurement standard devices for nanometrology, namely, measuring tools having a pattern in the micrometer or nanometer ranges; high-resolution masks and reticles for use in transferring patterns on wafers and other substrates
40
Production, namely, custom manufacture of structures in dimensions within the range of 5nm and 250nm
42
Services in the field of electron beam writing, namely, research, development, [ consultancy ] and customized exposure via focused electrons on solid state substrates, including Si, GaAs, InP, SiC, GaN and diamond; services in the field of process technology, namely, research, development [, and consultancy ] of structures in dimensions within the range of 5nm and 250nm [ ; design of, and technical support, namely, troubleshooting of problems, maintenance, and update for software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies ]
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