WE KNOW HOW TO WRITE NANOMETER

USPTO USPTO 2006 REGISTERED AND RENEWED

Protect this trademark from copycats!

With our trademark monitoring alerts, you are automatically notified by email about copycats and free riders.

The US trademark WE KNOW HOW TO WRITE NANOMETER was filed as Word mark on 04/12/2006 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 11/10/2009. The current status of the mark is "REGISTERED AND RENEWED".

Trademark Details

Trademark form Word mark
File reference 78860347
Register number 3708736
Application date April 12, 2006
Publication date August 25, 2009
Entry date November 10, 2009

Trademark owner

Lichtensteinstr. 12
89075 Ulm
DE

Trademark representatives

goods and services

9 [ Software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies; ] master substrates for high-resolution and ultra high-resolution replication technologies, namely, semiconductors, quartz and glass for use in patterning at nano scale or near nano scale; reference standards, namely, measurement standard devices for nanometrology, namely, measuring tools having a pattern in the micrometer or nanometer ranges; high-resolution masks and reticles for use in transferring patterns on wafers and other substrates
40 Production, namely, custom manufacture of structures in dimensions within the range of 5nm and 250nm
42 Services in the field of electron beam writing, namely, research, development, [ consultancy ] and customized exposure via focused electrons on solid state substrates, including Si, GaAs, InP, SiC, GaN and diamond; services in the field of process technology, namely, research, development [, and consultancy ] of structures in dimensions within the range of 5nm and 250nm [ ; design of, and technical support, namely, troubleshooting of problems, maintenance, and update for software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies ]

ID: 1378860347