HFF Logo (USPTO, 03.03.2008)
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Die US-Marke HFF wurde als Wort-Bildmarke am 03.03.2008 beim Amerikanischen Patent- und Markenamt angemeldet. Der aktuelle Status der Marke ist "ABANDONED - NO STATEMENT OF USE FILED".
| Markenform | Wort-Bildmarke |
| Aktenzeichen | 77410863 |
| Anmeldedatum | 03. März 2008 |
| Veröffentlichungsdatum | 29. Juli 2008 |
Markeninhaber
OVERSEAS CHINESE TOWN, NANSHAN DISTRICT
SHENZHEN, GUANGDONG
CN
SHENZHEN, GUANGDONG
CN
Waren und Dienstleistungen
1
Chlorine; rare earth metals; acids, namely, acetic acid, benzoic acid, citric acid; sodium hypochlorite; alkalies; ethylene; aluminum hydroxide; ethyl alcohol; methyl alcohol; phenols; aldehydes and ketones; methyl esters; agar; fuel for nuclear reactors; chemical motor oil additives; stain repellents for clothing, carpets, textiles; water purifying chemicals for swimming pools; detergents for industrial use; plastisols; silicon; unprocessed acrylic resins for use in a wide variety of fields; chemical products for brightening dyestuffs; chemicals for industrial purposes; bauxite; chemical reagents for non-medical purposes; photographic chemicals; unprocessed synthetic resins; soil conditioners for agricultural, domestic or horticultural use; fire-extinguishing compositions; soldering chemicals; chemical products for the fresh-keeping and preserving of food; tanning agents for use in the manufacture of leather; adhesives for industrial purposes; paper pulp; chemical compounds for curing concrete; salts from rare earth metals; starch for use in the manufacture of paper or textiles; aluminum oxide; fertilizers; gases for welding; metallic oxides; graphite in raw or semi-finished form for use in manufacture; rare earths; kaolin; epoxy resins; artificial resins; unprocessed plastics for industrial use; cellulose; chemical preparations in the nature of filtering materials in mineral substances; aluminum oxides (alumina); aluminum chloride; alloys of rare earth metals; hydrochloric acid (hydrogen chloride); hydrogen; liquid chlorine; metal chlorides; sulphuric acid; nitric acid; phosphoric acid; carbon tetrachloride; chemical additives for oils; chemical source material for the deposition of thin films upon semiconductor wafers for the manufacture of semiconductors; oxides; chemicals for use in industry and science; unprocessed plastics in all forms
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ID: 1377410863