HFF Logo (USPTO, 03/03/2008)
USPTOProtect this trademark from copycats!
With our trademark monitoring alerts, you are automatically notified by email about copycats and free riders.
The US trademark HFF was filed as Word and figurative mark on 03/03/2008 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED - NO STATEMENT OF USE FILED".
| Trademark form | Word and figurative mark |
| File reference | 77410863 |
| Application date | March 3, 2008 |
| Publication date | July 29, 2008 |
Trademark owner
OVERSEAS CHINESE TOWN, NANSHAN DISTRICT
SHENZHEN, GUANGDONG
CN
SHENZHEN, GUANGDONG
CN
goods and services
1
Chlorine; rare earth metals; acids, namely, acetic acid, benzoic acid, citric acid; sodium hypochlorite; alkalies; ethylene; aluminum hydroxide; ethyl alcohol; methyl alcohol; phenols; aldehydes and ketones; methyl esters; agar; fuel for nuclear reactors; chemical motor oil additives; stain repellents for clothing, carpets, textiles; water purifying chemicals for swimming pools; detergents for industrial use; plastisols; silicon; unprocessed acrylic resins for use in a wide variety of fields; chemical products for brightening dyestuffs; chemicals for industrial purposes; bauxite; chemical reagents for non-medical purposes; photographic chemicals; unprocessed synthetic resins; soil conditioners for agricultural, domestic or horticultural use; fire-extinguishing compositions; soldering chemicals; chemical products for the fresh-keeping and preserving of food; tanning agents for use in the manufacture of leather; adhesives for industrial purposes; paper pulp; chemical compounds for curing concrete; salts from rare earth metals; starch for use in the manufacture of paper or textiles; aluminum oxide; fertilizers; gases for welding; metallic oxides; graphite in raw or semi-finished form for use in manufacture; rare earths; kaolin; epoxy resins; artificial resins; unprocessed plastics for industrial use; cellulose; chemical preparations in the nature of filtering materials in mineral substances; aluminum oxides (alumina); aluminum chloride; alloys of rare earth metals; hydrochloric acid (hydrogen chloride); hydrogen; liquid chlorine; metal chlorides; sulphuric acid; nitric acid; phosphoric acid; carbon tetrachloride; chemical additives for oils; chemical source material for the deposition of thin films upon semiconductor wafers for the manufacture of semiconductors; oxides; chemicals for use in industry and science; unprocessed plastics in all forms
ID: 1377410863