Lasertec Logo (WIPO, 10/26/2022)
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The International trademark Lasertec was filed as Figurative mark on 10/26/2022 at the World Intellectual Property Organization.
Logodesign (Wiener Klassifikation)
#Letters presenting a special form of writing #Letters in heavy characters
| Trademark form | Figurative mark |
| File reference | 1708262 |
| Register number | 6612845 |
| Countries | 
|
| Base trademark |
No. 6612845,
September 9, 2022
|
| Application date | October 26, 2022 |
| Expiration date | October 26, 2032 |
Trademark owner
2-10-1 Shin-yokohama,
Kohoku-ku, Yokohama-shi
JP
Kohoku-ku, Yokohama-shi
JP
Trademark representatives
HIBIKI IP Law Firm,
Asahi Bldg. 5th Floor,
JP
goods and services
07
Defect repairing machines for photomasks for semiconductors;
defect repairing machines for reticles for semiconductors;
defect repairing machines for wafers for semiconductors;
defect repairing machines for photomasks for flat panel
displays; defect repairing machines for photomask blanks for
flat panel displays
09
Semiconductor photomask inspection apparatus; analyzing
apparatus for defect of photomasks for semiconductors;
semiconductor photomask pattern inspection apparatus;
semiconductor photomask pattern measuring apparatus;
semiconductor photomask imaging apparatus; semiconductor
photomask phase-shift measuring apparatus; semiconductor
photomask transmittance measuring apparatus; apparatus and
instruments for measuring semiconductor photomask phase
shifting amount; semiconductor reticle inspection apparatus;
analyzing apparatus for defect of semiconductor reticles;
semiconductor reticle pattern inspection apparatus;
semiconductor reticle pattern measuring apparatus;
semiconductor reticle imaging apparatus; semiconductor wafer
inspection apparatus; semiconductor wafer measuring
apparatus; semiconductor wafer imaging apparatus;
semiconductor wafer edge inspection apparatus; analyzing
apparatus for defect of wafers for semiconductors;
semiconductor photomask blanks inspection apparatus;
semiconductor photomask blanks imaging apparatus; flat panel
display photomask inspection apparatus; flat panel display
photomask pattern inspection apparatus; flat panel display
photomask pattern measuring apparatus; flat panel display
photomask blanks inspection apparatus; pellicle inspection
apparatus for photomasks for flat panel displays; pellicle
mounting apparatus for photomasks for flat panel displays;
confocal microscopes; laser microscopes; optical apparatus
and instruments; measuring apparatus; computer peripheral
devices; inspection apparatus for semi-conductor materials
and elements; semi-conductor testing machines and
instruments; electron microscopes; detectors; material
testing instruments and machines; testing apparatus not for
medical purposes; precision measuring apparatus; data sets,
recorded or downloadable; computer software, recorded;
computer software applications, downloadable; computer
hardware; computer programs, downloadable; systems for
in-situ visualizing of electro-chemical reactions
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| July 18, 2023 | 2023/29 Gaz | EM | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| June 21, 2023 | 2023/25 Gaz | US | Rejection |
| February 14, 2023 | 2023/8 Gaz | EM | Rejection |
| October 26, 2022 | 2023/1 Gaz | JP | Registration |
ID: 141708262