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The International trademark BASIC was filed as Word mark on 07/21/2022 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1692948 |
| Register number | 5636965 |
| Countries | 
|
| Base trademark |
No. 5636965,
December 13, 2013
|
| Application date | July 21, 2022 |
| Expiration date | July 21, 2032 |
Trademark owner
2-10-1 Shin-yokohama,
Kohoku-ku,
JP
Kohoku-ku,
JP
Trademark representatives
HIBIKI IP Law Firm,
Asahi Bldg. 5th Floor,
JP
goods and services
07
Defect repair machines for photomasks for semiconductors;
defect repair machines for reticles for semiconductors;
foreign matter removal machines for photomasks for
semiconductors; foreign matter removal machines for reticles
for semiconductors
09
Semiconductor photomask inspection apparatus; semiconductor
photomask pattern measuring apparatus; semiconductor reticle
inspection apparatus; semiconductor reticle pattern
measuring apparatus
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| July 26, 2023 | 2023/30 Gaz | EM | Rejection |
| June 20, 2023 | 2023/25 Gaz | US | Rejection |
| November 30, 2022 | 2022/49 Gaz | EM | Rejection |
| July 21, 2022 | 2022/42 Gaz | JP | Registration |
ID: 141692948