N

WIPO WIPO 2021

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The International trademark N was filed as Figurative mark on 10/04/2021 at the World Intellectual Property Organization.

Logodesign (Wiener Klassifikation)

#Surfaces or backgrounds covered with repeated geometrical figures, figurative elements or inscriptions #Circles #Letters presenting a special form of writing #Surfaces or backgrounds covered with repeated geometrical figures or designs #26.01.01 #One letter

Trademark Details Last update: May 29, 2023

Trademark form Figurative mark
File reference 1630855
Countries Canada China em United Kingdom Israel India Japan South Korea Malaysia Singapore
Base trademark US No. 90650917, April 16, 2021
Application date October 4, 2021
Expiration date October 4, 2031

Trademark owner

8025 Lamon Avenue
Skokie IL 60077
US

Trademark representatives

11800 Sunrise Valley Drive, 15th Floor US

goods and services

01 Chemicals for any of storage, dispensing, abatement, and purification of gases; chemical source material for the deposition of thin films for the manufacture of semiconductors; chemicals for industrial purposes; chemical adsorbents for separating constituents in fluids; chemical adsorbents for separating impurities or other constituents in industrial flow streams; chemical adsorbents applied to a substrate for separating constituents in fluids; chemical adsorbents applied to a substrate for separating impurities or other constituents in industrial flow streams; chemical adsorbents for removing or deactivating any one or more of impurities, pollutants, biological agents and toxic chemicals from air or other gases; chemical adsorbents to be applied to substrates for removing or deactivating any one or more of impurities, pollutants, biological agents and toxic chemicals from air or other gases; chemicals scaffold materials to physically or chemically carry, enclose, or stabilize active constituents for enabling controlled release, constituent delivery, catalytical reactions, imaging signal enhancement, or analytical characterization
42 Research and development in the fields of metal organic frameworks (MOFs), molecularly engineered materials, and molecular manufacturing; product research and development; product research and development services in the fields of MOFs, molecularly engineered materials, and molecular manufacturing for use in the electronics, life sciences, industrial, and defense sectors; research and development of technology in the field of MOFs, molecularly engineered materials, and molecular manufacturing

Trademark history

Date Document number Area Entry
May 25, 2023 2023/21 Gaz MY Rejection
March 10, 2023 2023/11 Gaz CA Rejection
February 16, 2023 2023/8 Gaz JP RAW: Rule 18ter(2)(ii) GP following a provisional refusal
February 1, 2023 2023/5 Gaz KR Rejection
October 25, 2022 2022/48 Gaz IN RAW: Rule 18ter(2)(i) GP following a provisional refusal
September 19, 2022 2022/50 Gaz SG Rejection
September 1, 2022 2022/35 Gaz JP Rejection
August 2, 2022 2022/32 Gaz IL Rejection
June 21, 2022 2022/25 Gaz CN Rejection
May 2, 2022 2022/18 Gaz EM Rejection
March 7, 2022 2022/10 Gaz GB Rejection
December 21, 2021 2021/52 Gaz IN Rejection
October 4, 2021 2021/47 Gaz US Registration

ID: 141630855