KCTECH Logo (WIPO, 22.05.2017)
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Die Internationale Marke KCTECH wurde als Bildmarke am 22.05.2017 bei der Weltorganisation für geistiges Eigentum angemeldet.
Logodesign (Wiener Klassifikation)
#Briefe, die eine besondere Form des Schreibens darstellen #Farben #Zwei vorherrschende Farben
| Markenform | Bildmarke |
| Aktenzeichen | 1382936 |
| Länder | 
|
| Basismarke |
Nr. 4020160102855,
23. November 2016
|
| Anmeldedatum | 22. Mai 2017 |
| Ablaufdatum | 22. Mai 2027 |
Markeninhaber
39, Je2gongdan 2-gil,
Miyang-myeon,
KR
Miyang-myeon,
KR
Markenvertreter
8F, Jinyoung Bldg.,
560, Eonju-ro,
KR
Waren und Dienstleistungen
01
Auxiliary fluids for use with semiconductor abrasives;
chemical mechanical polishing slurry; chemical mechanical
planarization slurry; chemical slurries for polishing
semiconductors; ceria slurries for abrading semiconductor
for industrial purposes; epoxy resins, unprocessed;
acrylonitrile butadiene styrene resins; styrene
acrylonitrile resins; phenolic resins; polyallylate resins;
polyamide resins; polyester resins; polymethyl metacrylate
resins; gas for processing semiconductor; plasma gas for
semiconductor manufacturing process; exposed gas for
semiconductor manufacturing process; etching gas for
semiconductor manufacturing process
07
Semiconductor wafer processing machines; wet cleaning
equipment for manufacture of semiconductors for research and
development; semiconductor processing machines; chemical
mechanical polishing apparatus for semiconductor wafer;
abrasive machine for semiconductor wafer; semiconductor
wafer processor support; semiconductor processing equipment
for research and development; wet cleaning equipment for
manufacture of semiconductors; cleaning equipment for
semiconductor wafer; deposition equipment for organic light
emitting diode (OLED) wet stations for manufacture of
semiconductors; vacuum pump for manufacture of
semiconductors; gas cabinet for manufacture of
semiconductors; MCVD machine for manufacture of
semiconductors; scrubbers for manufacture of semiconductors;
purifier for manufacture of semiconductors; cleaning
equipment for LCD industry; cleaning equipment for part of
LCD; cleaning equipment for LCD supplies; equipment to
produce LCD products; apparatus for PR coating; deposition
equipment for manufacture of semiconductors; deposition
equipment for manufacture of LCD; substrate surface handling
equipment using plasma; cleaning equipment for flat panel
display using CO2; valves for gas supply [parts of
machines]
42
Mold design; design of machinery; design of machines and
apparatus; design of semiconductors; design of integrated
circuit; research on construction technology; quality
control; design of parts of machines; mechanical drawing;
research relating to mechanical engineering; mechanical
research; chemistry services; chemical research and
analysis; chemical research; product analysis; product
testing; testing of product stability
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 01. August 2019 | 2019/35 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 14. März 2019 | 2019/12 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 11. März 2019 | 2019/11 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 18. Oktober 2018 | 2018/42 Gaz | CN | Ablehnung |
| 27. September 2018 | 2018/39 Gaz | JP | Ablehnung |
| 18. April 2018 | 2018/17 Gaz | SG | Ablehnung |
| 24. Januar 2018 | 2018/5 Gaz | US | Ablehnung |
| 22. Mai 2017 | 2017/51 Gaz | KR | Eintragung |
ID: 141382936