KCTECH Logo (WIPO, 05/22/2017)
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The International trademark KCTECH was filed as Figurative mark on 05/22/2017 at the World Intellectual Property Organization.
Logodesign (Wiener Klassifikation)
#Letters presenting a special form of writing #Colours #Two predominant colours
| Trademark form | Figurative mark |
| File reference | 1382936 |
| Countries | 
|
| Base trademark |
No. 4020160102855,
November 23, 2016
|
| Application date | May 22, 2017 |
| Expiration date | May 22, 2027 |
Trademark owner
39, Je2gongdan 2-gil,
Miyang-myeon,
KR
Miyang-myeon,
KR
Trademark representatives
8F, Jinyoung Bldg.,
560, Eonju-ro,
KR
goods and services
01
Auxiliary fluids for use with semiconductor abrasives;
chemical mechanical polishing slurry; chemical mechanical
planarization slurry; chemical slurries for polishing
semiconductors; ceria slurries for abrading semiconductor
for industrial purposes; epoxy resins, unprocessed;
acrylonitrile butadiene styrene resins; styrene
acrylonitrile resins; phenolic resins; polyallylate resins;
polyamide resins; polyester resins; polymethyl metacrylate
resins; gas for processing semiconductor; plasma gas for
semiconductor manufacturing process; exposed gas for
semiconductor manufacturing process; etching gas for
semiconductor manufacturing process
07
Semiconductor wafer processing machines; wet cleaning
equipment for manufacture of semiconductors for research and
development; semiconductor processing machines; chemical
mechanical polishing apparatus for semiconductor wafer;
abrasive machine for semiconductor wafer; semiconductor
wafer processor support; semiconductor processing equipment
for research and development; wet cleaning equipment for
manufacture of semiconductors; cleaning equipment for
semiconductor wafer; deposition equipment for organic light
emitting diode (OLED) wet stations for manufacture of
semiconductors; vacuum pump for manufacture of
semiconductors; gas cabinet for manufacture of
semiconductors; MCVD machine for manufacture of
semiconductors; scrubbers for manufacture of semiconductors;
purifier for manufacture of semiconductors; cleaning
equipment for LCD industry; cleaning equipment for part of
LCD; cleaning equipment for LCD supplies; equipment to
produce LCD products; apparatus for PR coating; deposition
equipment for manufacture of semiconductors; deposition
equipment for manufacture of LCD; substrate surface handling
equipment using plasma; cleaning equipment for flat panel
display using CO2; valves for gas supply [parts of
machines]
42
Mold design; design of machinery; design of machines and
apparatus; design of semiconductors; design of integrated
circuit; research on construction technology; quality
control; design of parts of machines; mechanical drawing;
research relating to mechanical engineering; mechanical
research; chemistry services; chemical research and
analysis; chemical research; product analysis; product
testing; testing of product stability
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| August 1, 2019 | 2019/35 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| March 14, 2019 | 2019/12 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| March 11, 2019 | 2019/11 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| October 18, 2018 | 2018/42 Gaz | CN | Rejection |
| September 27, 2018 | 2018/39 Gaz | JP | Rejection |
| April 18, 2018 | 2018/17 Gaz | SG | Rejection |
| January 24, 2018 | 2018/5 Gaz | US | Rejection |
| May 22, 2017 | 2017/51 Gaz | KR | Registration |
ID: 141382936