TOYO K Logo (WIPO, 17.10.2008)
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Die Internationale Marke TOYO K wurde als Bildmarke am 17.10.2008 bei der Weltorganisation für geistiges Eigentum angemeldet.
Logodesign (Wiener Klassifikation)
#Kreise #Ein Kreis #Kreise, die einen oder mehrere Buchstaben enthalten
| Markenform | Bildmarke |
| Aktenzeichen | 989681 |
| Länder | 
|
| Basismarke |
Nr. 2008-030243,
17. April 2008
|
| Anmeldedatum | 17. Oktober 2008 |
| Ablaufdatum | 17. Oktober 2018 |
Markeninhaber
Markenvertreter
Umeda Hankyu Blds,
Office Tower, 8-1,
JP
Waren und Dienstleistungen
01
Carbon; carbides; carbon for producing fullerene and carbon
nanotube; carbon compounds for producing fullerene and
carbon nanotube; chemicals composed of fullerene and carbon
nanotube structure; chemicals
07
Metalworking machines, tools and their parts and fittings;
chemical processing machines, apparatus and their parts and
fittings; glassware manufacturing machines, apparatus and
their parts and fittings; nozzles made of carbon fiber for
arc-welding machine; parts and fittings for semiconductor
manufacturing machines and systems used for producing
epitaxial structures for semiconductor wafers; susceptors
for holding wafers as parts of semiconductor manufacturing
machines and systems; parts and fittings for compound
semiconductor manufacturing machines and systems; parts and
fittings for semiconductor manufacturing machines and
systems used for producing epitaxial structures for compound
semiconductor wafers; susceptors for holding wafers as parts
of machines and systems for manufacturing compound
semiconductors; semiconductor manufacturing machines,
systems and their parts and fittings; parts for non-electric
prime movers for land vehicles; bearings (machine elements
not for land vehicles); electric brushes; parts and fittings
for electric wires and cables manufacturing machines and
systems; susceptors for holding silicon wafers as parts of
semiconductor manufacturing machines and systems; susceptors
for holding wafers as parts of plasma-enhanced chemical
vapour deposition (CVD) machines used for manufacturing
semiconductors; susceptors for holding wafers as parts of
metal-organic CVD machines for manufacturing semiconductors;
parts and fittings for compressors for machines and systems
for generating fluorine gas and for generating gas including
chemical elements of fluorine gas; parts and fittings for
non-electric prime movers (not for land vehicles); machines
elements (not for land vehicles); parts and fittings of
motor or engines for satellite launching vehicles, namely
nozzle throats
09
Electrolysers (electrolytic cells) and their parts and
fittings; crucibles, namely containers for melting silicon
or germanium for semiconductors; crucibles, namely
containers for melting material for compound semiconductors;
crucibles, namely containers for melting material at high
temperatures; crucibles, namely containers for melting
metals at high temperatures; laboratory apparatus,
instruments and their parts and fittings; measuring or
testing machines, instruments and their parts and fittings;
parts and fittings for electronic machines and apparatus;
carbon electrodes for manufacturing fullerene; electrolytic
cells (electrolyzers) for machines and systems for
generating fluorine gas and for generating gas including
chemical elements of fluorine gas; electrodes for plasma
etching equipment; electrodes for electric discharge
machining; electrodes for electrolytic polishing apparatus;
electrodes for machines and systems for generating fluorine
gas and for generating gas including chemical elements of
fluorine gas; electrodes and their fittings
11
Heat exchangers (for chemical processing) and their parts
and fittings; heaters for semiconductor manufacturing
machines and systems; heaters for compound semiconductor
manufacturing machines and systems; jigs for holding wafers
as parts of diffusion furnaces; heaters for crucibles;
industrial furnaces and their parts and fittings; parts and
fittings for furnaces used for growing single crystals using
the pulling method for the manufacture of semiconductors;
parts and fittings for furnaces used for producing epitaxial
structures for semiconductor wafers; parts and fittings for
thermal diffusion furnaces for inducting dopant for
semiconductor; parts and fittings for furnaces of forming
semiconductor thin films; parts and fittings for electric
furnaces used for growing crystals for the manufacture of
semiconductors; parts for carbon fiber reinforced carbon
composite material for industrial furnaces; parts and
fittings of furnaces for annealing treatment machines; parts
and fittings of furnaces for crystal growth system;
crucibles, namely containers for melting material as parts
of industrial furnaces; susceptors for holding materials as
parts of industrial furnaces; heaters for industrial
furnaces; industrial furnaces; parts for carbon fiber
reinforced carbon composite material for nuclear reactors
(atomic piles); nuclear reactors (atomic piles) and their
parts and fittings; fluorine gas generating machines,
systems and their parts and fittings; machines and systems
for generating fluorine gas and for generating gas including
chemical elements of fluorine gas; heating devices for
machines and systems for generating fluorine gas and for
generating gas including chemical elements of fluorine gas;
industrial boilers and their parts and fittings;
non-electric heaters and their parts and fittings; parts and
fittings for electric furnaces for growing crystals for the
manufacture of compound semiconductors; stainless steel
reservoir tanks for gas generators used for generating
fluorine gas and other gases, including chemical elements of
fluorine gas
12
Parts and fittings for aircraft; railway rolling stock and
their parts and fittings; automobiles and their parts and
fittings; machine elements for land vehicles, namely
bearings (for land vehicles) and vane for brake pump
17
Seals; gaskets; joints for pipes (not of metal); packings
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 27. April 2019 | 2019/17 Gaz | Löschung | |
| 28. März 2018 | 2018/14 Gaz | US | RAW: Total Invalidation |
| 04. April 2011 | 2013/5 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 19. Mai 2010 | 2013/3 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 11. August 2009 | 2009/44 Gaz | JP | RAW: Partial Ceasing Effect |
| 13. Februar 2009 | 2009/8 Gaz | US | Ablehnung |
| 17. Oktober 2008 | JP | Eintragung |
ID: 14989681