Hoesch Low Purity

WIPO WIPO 2000

Protect this trademark from copycats!

With our trademark monitoring alerts, you are automatically notified by email about copycats and free riders.

The International trademark Hoesch Low Purity was filed as Word mark on 01/05/2000 at the World Intellectual Property Organization.

Trademark Details Last update: January 8, 2020

Trademark form Word mark
File reference 726602
Register number 39958389.0/01
Countries China
Base trademark DE No. 399 58 389.0/01, November 9, 1999
Application date January 5, 2000
Expiration date January 5, 2030

Trademark owner

Kaiser-Wilhelm-Strasse 100
47166 Duisburg
DE

Trademark representatives

ThyssenKrupp Allee 1 45143 Essen DE

goods and services

01 Chemical products for use in industry, science, photography, agriculture, horticulture and forestry
02 Paints, varnishes, lacquers; colorants; metals in powder form for painters, decorators, printers and artists
06 Common metals and their alloys; metal and oxide powders; ores

Trademark history

Date Document number Area Entry
January 5, 2020 2020/2 Gaz Extension
January 5, 2010 2010/7 Gaz Extension
January 27, 2009 2009/10 Gaz CN Decision on opposition
March 24, 2003 2003/8 Gaz CN RAW: Final Confirmation Refusal
December 2, 2002 2002/24 Gaz HU Decision on opposition
February 5, 2002 2002/8 Gaz RO Decision on opposition
July 2, 2001 2001/17 Gaz UA RAW: Final Confirmation Refusal
March 15, 2001 2001/7 Gaz RU RAW: Final Confirmation Refusal
February 22, 2001 2001/5 Gaz HU Rejection
February 21, 2001 2001/4 Gaz RO Rejection
January 9, 2001 2001/1 Gaz UA Rejection
January 5, 2001 2001/2 Gaz KP RAW: Final Reversing Refusal
December 29, 2000 2001/1 Gaz RU RAW: Disclaimer
November 2, 2000 2000/22 Gaz CN Rejection
August 10, 2000 2000/17 Gaz KP Rejection
January 5, 2000 2000/3 Gaz DE Registration
Partial deletion

ID: 14726602