Veeco Logo (WIPO, 06.04.2022)
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Die Internationale Marke Veeco wurde als Bildmarke am 06.04.2022 bei der Weltorganisation für geistiges Eigentum angemeldet.
Logodesign (Wiener Klassifikation)
#Kreise #Briefe, die eine besondere Form des Schreibens darstellen #26.01.02 #Kreise mit über den Umfang hinausragenden Inschriften
| Markenform | Bildmarke |
| Aktenzeichen | 1696518 |
| Länder | 
|
| Basismarke |
Nr. 97062354,
06. Oktober 2021
|
| Anmeldedatum | 06. April 2022 |
| Ablaufdatum | 06. April 2032 |
Markeninhaber
1 Terminal Drive
Plainview NY 11803
US
Plainview NY 11803
US
Markenvertreter
840 N. Plankinton Ave.
Milwaukee WI 53203
US
Waren und Dienstleistungen
07
Machines and apparatus for manufacturing, namely, physical,
chemical and electro technical equipment and parts
therefore, diamond like carbon systems, ion beam deposition
systems and ion beam sources therefore, ion beam etch
systems, physical vapor deposition systems, lapping/dicing
systems, thermal deposition sources; machines and apparatus
for manufacturing, namely, molecular beam epitaxy (MBE)
systems including components therefore and metal organic
chemical vapor deposition (MOCVD) systems including wafer
carriers and components therefore, and wafer processing
machines including components therefore; laser annealing
systems comprised of lasers for annealing purposes including
components therefore; photolithographic machines for
manufacturing semiconductor wafers and other substrates
including components therefore; semiconductor wafer
processing machines for atomic layer deposition systems
including components therefore; semiconductor wafer
processing equipment; semiconductor single wafer processing
machines using etch chemicals for the semiconductor
industry; semiconductor single wafer wet processing machines
using solvent chemicals; machines containing ion sources and
ion source controllers for vacuum coating processes;
molecular beam epitaxy crucibles and effusion cells for
manufacturing semi-conductors and integrated circuits;
heated high speed rotating disks operated under high vacuum
and exposed to the flow of chemicals in the production of
semiconductors; optical coating ion beam machine for coating
multi-layer optical thin films including components
therefore
09
Gas sensors and controls for regulating gas concentrations
and/or mass transfer rates in various manufacturing
processes; computer control software for use in ion beam
system applications through touch screen mode
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 03. August 2023 | 2023/31 Gaz | JP | Ablehnung |
| 04. Mai 2023 | 2023/19 Gaz | CN | Ablehnung |
| 24. April 2023 | 2023/17 Gaz | GB | Ablehnung |
| 06. April 2023 | 2023/15 Gaz | EM | Ablehnung |
| 06. April 2022 | 2022/44 Gaz | US | Eintragung |
ID: 141696518