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Die Internationale Marke MAKING A MATERIAL DIFFERENCE wurde als Wortmarke am 30.03.2022 bei der Weltorganisation für geistiges Eigentum angemeldet.
| Markenform | Wortmarke |
| Aktenzeichen | 1690954 |
| Länder | 
|
| Basismarke |
Nr. 97062323,
06. Oktober 2021
|
| Anmeldedatum | 30. März 2022 |
| Ablaufdatum | 30. März 2032 |
Markeninhaber
1 Terminal Drive
Plainview NY 11803
US
Plainview NY 11803
US
Markenvertreter
840 N. Plankinton Ave.
Milwaukee WI 53203
US
Waren und Dienstleistungen
07
Manufacturing machines and apparatus, namely, physical,
chemical and electro technical equipment, and parts
therefore, diamond like carbon systems, ion beam deposition
systems and ion beam sources therefore, ion beam etch
systems, physical vapor deposition systems, lapping/dicing
systems, thermal deposition sources; semiconductor
fabrication machines and magnetic storage fabrication
machines including components therefore; manufacturing
machines and apparatus, namely, molecular beam epitaxy (MBE)
systems including components therefore and metal organic
chemical vapor deposition (MOCVD) systems including wafer
carriers and components therefore, wafer processing machines
including components therefore; laser annealing systems
comprised of lasers for annealing purposes including
components therefore; photolithographic machines for
manufacturing semiconductor wafers and other substrates
including components therefore; semiconductor wafer
processing machines for atomic layer deposition systems
including components therefore; semiconductor wafer
processing equipment; semiconductor single wafer processing
machines using etch chemicals for the semiconductor
industry; semiconductor single wafer wet processing machines
using solvent chemicals; machines containing ion sources and
ion source controllers for vacuum coating processes;
molecular beam epitaxy crucibles and effusion cells for
manufacturing semi-conductors and integrated circuits;
heated high speed rotating disks operated under high vacuum
and exposed to the flow of chemicals in the production of
semiconductors; optical coating ion beam machine for coating
multi-layer optical thin films including components
therefore; physical vapor deposition systems, lapping/dicing
systems; semiconductor fabrication machines and magnetic
storage fabrication machines including components therefore;
metal organic chemical vapor deposition (MOCVD) systems,
wafer processing machines including components therefore;
photolithographic machines for manufacturing semiconductor
wafers and other substrates including components therefore;
semiconductor wafer processing machines for atomic layer
deposition systems including components therefore;
semiconductor wafer processing equipment; semiconductor
single wafer processing machines using etch chemicals for
the semiconductor industry; semiconductor single wafer wet
processing machines using solvent chemicals; machines
containing ion sources and ion source controllers for vacuum
coating processes; heated high speed rotating disks operated
under high vacuum and exposed to the flow of chemicals in
the production of semiconductors; optical coating ion beam
machine for coating multi-layer optical thin films including
components therefore
09
Scientific machines and apparatus, namely, physical,
chemical and electro technical equipment, and parts
therefore, diamond like carbon systems, ion beam deposition
systems and ion beam sources therefore, ion beam etch
systems, thermal deposition sources; scientific machines and
apparatus, namely, molecular beam epitaxy (MBE) systems
including components therefore and including wafer carriers
and components therefore; laser annealing systems comprised
of lasers for annealing purposes including components
therefore; gas sensors and controls for regulating gas
concentrations and/or mass transfer rates in various
manufacturing processes; molecular beam epitaxy crucibles
and effusion cells for manufacturing semi-conductors and
integrated circuits; computer control software for use in
ion beam system applications through touch screen mode; gas
sensors and controls for regulating gas concentrations
and/or mass transfer rates in various manufacturing
processes; computer control software for use in ion beam
system applications through touch screen mode
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 03. August 2023 | 2023/31 Gaz | JP | Ablehnung |
| 08. Juli 2023 | 2023/28 Gaz | GB | RAW: Rule 18ter(2)(i) GP following a provisional refusal |
| 18. November 2022 | 2022/47 Gaz | GB | Ablehnung |
| 15. November 2022 | 2022/47 Gaz | EM | Ablehnung |
| 30. März 2022 | 2022/40 Gaz | US | Eintragung |
ID: 141690954