SUMIRESIST

WIPO WIPO 2021

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The International trademark SUMIRESIST was filed as Word mark on 11/05/2021 at the World Intellectual Property Organization.

Trademark Details Last update: June 28, 2023

Trademark form Word mark
File reference 1634414
Countries Switzerland European Community United Kingdom Israel India South Korea Malaysia Singapore Thailand United States of America (USA)
Base trademark JP No. 2021-136398, November 2, 2021
Application date November 5, 2021
Expiration date November 5, 2031

Trademark owner

2-7-1, Nihonbashi,
Chuo-ku
JP

Trademark representatives

Tennoz Central Tower, 2-2-24 Higashi-Shinagawa, JP

goods and services

01 Photoresists; chemical coatings, namely, acid or alkali resistant non-conducting coating used to protect desired portions of a circuit pattern from the action of the etchant in the manufacture of semiconductor devices; chemicals for use in the manufacture of products and components for the electronic and semiconductor industry

Trademark history

Date Document number Area Entry
June 12, 2023 2023/24 Gaz MY Rejection
June 10, 2023 2023/24 Gaz US RAW: Rule 18ter(2)(ii) GP following a provisional refusal
June 6, 2023 2023/23 Gaz TH Rejection
January 20, 2023 2023/4 Gaz KR Rejection
November 14, 2022 2022/46 Gaz CH Rejection
October 25, 2022 2022/44 Gaz IN Rejection
September 19, 2022 2022/38 Gaz US Rejection
September 19, 2022 2022/50 Gaz SG Rejection
September 4, 2022 2022/36 Gaz IL Rejection
June 8, 2022 2022/23 Gaz GB Rejection
May 20, 2022 2022/21 Gaz EM Rejection
November 5, 2021 2021/49 Gaz JP Registration

ID: 141634414