HYOSUNG Neochem Absolute Quality & Safety Logo (WIPO, 23.04.2021)
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Die Internationale Marke HYOSUNG Neochem Absolute Quality & Safety wurde als Bildmarke am 23.04.2021 bei der Weltorganisation für geistiges Eigentum angemeldet.
Logodesign (Wiener Klassifikation)
#Briefe, die eine besondere Form des Schreibens darstellen #Farben #Serie von Briefen, die verschiedene Formen des Schreibens darstellen #Buchstabenreihen in verschiedenen Dimensionen #Blau
| Markenform | Bildmarke |
| Aktenzeichen | 1599735 |
| Länder | 
|
| Basismarke |
Nr. ,
02. August 2024
|
| Anmeldedatum | 23. April 2021 |
| Ablaufdatum | 23. April 2031 |
Markeninhaber
119(Gongdeok-dong),
Mapo-daero,
KR
Mapo-daero,
KR
Markenvertreter
Oori Patent & Law Office,
5F. Sindo B/D, 11-4,
KR
Waren und Dienstleistungen
01
High purity mixture gas for cleaning semiconductor; high
purity nitrogen compounds for etching semiconductor; high
purity mixture gas for cleaning display; high purity NF3 for
cleaning display; special gas for chemical purposes used for
cleaning semiconductor equipment; mixture gas for use in the
manufacture of semiconductors; gas for processing
semiconductor; ultra high purity gas for use in the
manufacture of semiconductors; Nitron Fluorine Three (NF3);
high purity mixture gas for cleaning solar batteries;
special gas for chemical purposes; fluoride for cleaning
purposes; gas purifying preparations; degassing agents;
carbonic acid gas; chemical preparations for use in
industry; quenching fluids for use in metalworking;
detergents for metal surface (not including detergents for
household purposes); coolants; chemical compositions for
metal plating; inorganic industrial chemicals; oxides;
hydrates; alkalies; compressed air; organic industrial
chemicals; organic acids; argon; nitrogen; nitrogen
compounds; catalysts for use in chemical processes;
antifreeze; bromine for chemical purposes; chemical
sorbents; enzyme stabilizers; salts [chemical preparations];
bases [chemical preparations]; etchants for use in the
manufacture of semiconductors
40
Gas production services; gas processing services; gas
compression services; purification of gases; petroleum gas
liquefaction; treatment of hazardous gases; processing of
natural gas; refining of natural gas; processing and
assembly of semiconductors; polishing of semiconductor;
recycling of chemicals; natural gas liquefaction services;
processing of metal surface using industrial chemicals;
treatment and coating of metal surfaces; coating of metal
surfaces using physical vapor deposition or chemical vapor
deposition processes; mineral accurate treatment; chemical
treatment of liquids; organic accurate treatment; processing
of compounds; processing of chemicals
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 07. April 2023 | 2023/18 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 06. Oktober 2022 | 2022/41 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 21. Mai 2022 | 2022/27 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 21. April 2022 | 2022/16 Gaz | JP | Ablehnung |
| 20. April 2022 | 2022/17 Gaz | MY | Ablehnung |
| 11. Februar 2022 | 2022/7 Gaz | DE | Ablehnung |
| 13. Januar 2022 | 2022/2 Gaz | US | Ablehnung |
| 18. November 2021 | 2021/49 Gaz | CN | Ablehnung |
| 09. November 2021 | 2021/45 Gaz | FR | Ablehnung |
| 04. Oktober 2021 | 2021/40 Gaz | RU | Ablehnung |
| 13. September 2021 | 2021/37 Gaz | BX | Ablehnung |
| 07. September 2021 | 2021/37 Gaz | SG | Ablehnung |
| 19. Juli 2021 | 2021/31 Gaz | PH | Ablehnung |
| 23. April 2021 | 2021/24 Gaz | KR | Eintragung |
ID: 141599735