1011709 Logo (WIPO, 05/31/2017)
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The International trademark 1011709 was filed as Figurative mark on 05/31/2017 at the World Intellectual Property Organization.
Logodesign (Wiener Klassifikation)
#Triangles, lines forming an angle #Quadrilaterals #Different geometrical figures, juxtaposed, joined or intersecting #Geometrical solids #Colours #Several triangles, juxtaposed, joined or intersecting #Triangular figures with one or more truncated or rounded angles #Other combinations of different geometrical figures, juxtaposed, joined or intersecting, combinations of more than two different geometrical figures #Pyramids #Cubes #Red, pink, orange
| Trademark form | Figurative mark |
| File reference | 1360835 |
| Register number | 1011709 |
| Countries | 
|
| Base trademark |
No. 1011709,
May 29, 2017
|
| Application date | May 31, 2017 |
| Expiration date | May 31, 2027 |
Trademark owner
Versterkerstraat 8
1322 AP ALMERE
NL
1322 AP ALMERE
NL
Trademark representatives
Hoogoorddreef 5
1101 BA Amsterdam
NL
goods and services
01
Chemical source material for the deposition of thin film
layers upon semiconductor wafers and substrates in the
manufacture of semiconductors
07
Machines for the assembly and packaging of electronic chips;
machines for manufacturing semiconductors, and structural
parts and fittings therefor; semiconductor manufacturing
machines; semiconductor manufacturing machines and systems
composed of a vacuum chamber for accommodating semiconductor
wafers and structural parts and machines for handling and
transferring semiconductor wafers into and out of vacuum
chamber, and structural parts and fittings therefor;
machines for the treatment of semiconductor wafers, namely,
semi-conductor wafer processing equipment, and structural
parts and fittings therefor; industrial chemical reactors;
industrial robots
09
Electrical reactors for processing semiconductor wafers;
reactors for processing semiconductor wafers, namely,
chemical reactors for the thermal treatment of semiconductor
wafers and reactors for chemical vapor deposition;
laboratory chemical reactors; robots being electronic
control devices, namely, laboratory robots; electronic
controllers for the semiconductor industry; electronic
control systems for machines; structural parts and fittings
for the aforementioned goods
35
Business intermediary services in the fields of buying,
selling, importing and exporting of equipment for the
deposition of thin film layers used in the manufacture of
semiconductors, machines and apparatus for the assembly and
packaging of electronic chips, apparatus for manufacturing
semiconductors and parts and fittings therefor,
semiconductor manufacturing machines and systems and parts
and fittings therefor, and machines for the treatment of
semiconductor wafers and semi-conductor wafer processing
equipment and parts and fittings therefor; retail,
wholesale, and online sale services in the fields of
equipment for the deposition of thin film layers used in the
manufacture of semiconductors, machines and apparatus for
the assembly and packaging of electronic chips, apparatus
for manufacturing semiconductors and parts and fittings
therefor, semiconductor manufacturing machines and systems
and parts and fittings therefor, and machines for the
treatment of semiconductor wafers and semi-conductor wafer
processing equipment and parts and fittings therefor
37
Construction, installation, repair and maintenance of
semiconductor and semiconductor wafer manufacturing machines
and systems
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| January 2, 2023 | 2023/5 Gaz | IL | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| September 14, 2022 | 2022/39 Gaz | MY | Rejection |
| July 28, 2022 | 2022/30 Gaz | US | Rejection |
| March 11, 2022 | 2022/12 Gaz | IL | Rejection |
| October 19, 2021 | 2021/43 Gaz | Correction | |
| November 13, 2018 | 2018/46 Gaz | KR | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| July 18, 2018 | 2018/46 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| June 28, 2018 | 2018/29 Gaz | CN | Rejection |
| February 22, 2018 | 2018/9 Gaz | JP | Rejection |
| February 20, 2018 | 2018/8 Gaz | KR | Rejection |
| January 19, 2018 | 2018/4 Gaz | EM | Rejection |
| January 8, 2018 | 2018/2 Gaz | IN | Rejection |
| December 27, 2017 | 2018/2 Gaz | SG | Rejection |
| May 31, 2017 | 2017/31 Gaz | BX | Registration |
ID: 141360835