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The International trademark RETICLEAN was filed as Word mark on 09/20/2016 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1343026 |
| Countries | 
|
| Base trademark |
No. 87166812,
September 9, 2016
|
| Application date | September 20, 2016 |
| Expiration date | September 20, 2026 |
Trademark owner
M/S 1269,
3050 Bowers Ave.
US
3050 Bowers Ave.
US
Trademark representatives
1100 Peachtree Street, STE 2800,
M/S: IP Docketing - 22
US
goods and services
07
Equipment and machines for the processing and production of
semiconductor substrates, thin films, silicon discs and
wafers, namely, machines for cleaning a surface and
polishing machines for use in polishing semiconductor
substrates, thin films, silicon discs and wafers
09
Equipment and machines for the processing and production of
semiconductor substrates, thin films, silicon discs and
wafers, namely, process monitoring software and
semiconductor measuring equipment in the nature of
diagnostic computers and electronic imaging apparatus for
the measuring and inspection of semiconductor processing and
production
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| September 25, 2018 | 2018/39 Gaz | CN | Rejection |
| January 30, 2018 | 2018/5 Gaz | KR | Rejection |
| October 26, 2017 | 2017/43 Gaz | SG | Rejection |
| October 6, 2017 | 2017/41 Gaz | EM | Rejection |
| September 21, 2017 | 2017/38 Gaz | JP | Rejection |
| September 20, 2016 | 2017/16 Gaz | US | Registration |
ID: 141343026