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The International trademark EPIREVO was filed as Word mark on 04/02/2014 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1222565 |
| Countries | 
|
| Base trademark |
No. 2013-090953,
November 20, 2013
|
| Application date | April 2, 2014 |
| Expiration date | April 2, 2024 |
Trademark owner
8-1, Shinsugita-cho, Isogo-ku,
Yokohama-shi
JP
Yokohama-shi
JP
Trademark representatives
TERASAKI BLDG. No. 2, 4th Fl.,
12-15, Nihonbashi-Muromachi 1-Chome,
JP
goods and services
07
Apparatus for depositing on semiconductor wafers; apparatus
for performing epitaxial growth on semiconductor wafers;
apparatus for forming compound semiconductor films on
semiconductor wafers; Metal Organic Chemical Vapor
Deposition (MOCVD) apparatus; Chemical Vapor Deposition
(CVD) apparatus; etching apparatus; other semiconductor
manufacturing apparatus; apparatus and devices used for the
aforesaid apparatus, namely, reduced pressure control
apparatus, temperature control apparatus, rotation control
apparatus, other control apparatus, gas supply apparatus,
exhaust gas treatment apparatus, wafer carrier devices,
wafer carrier robots, wafer cleaning apparatus, temperature
measuring devices, wafer curvature measuring apparatus;
parts, accessories and pipes for the aforesaid goods
37
Repair, maintenance and installation of apparatus for
depositing on semiconductor wafers, apparatus for performing
epitaxial growth on semiconductor wafers, apparatus for
forming compound semiconductor films on semiconductor
wafers, Metal Organic Chemical Vapor Deposition (MOCVD)
apparatus, Chemical Vapor Deposition (CVD) apparatus,
etching apparatus, other semiconductor manufacturing
apparatus and parts, accessories and pipes therefor; repair,
maintenance and installation of apparatus and devices used
for semiconductor manufacturing apparatus, namely, reduced
pressure control apparatus, temperature control apparatus,
rotation control apparatus, other control apparatus, gas
supply apparatus and their parts, exhaust gas treatment
apparatus and their parts, wafer carrier devices, wafer
carrier robots, wafer cleaning apparatus, temperature
measuring devices, wafer curvature measuring apparatus and
parts, accessories and pipes for the aforesaid apparatus and
devices; information supply with regards to repair,
maintenance and installation of the aforesaid apparatus and
devices, their parts, accessories and pipes
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| August 29, 2016 | 2016/37 Gaz | IN | Rejection |
| May 27, 2016 | 2016/35 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| December 2, 2015 | 2015/49 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| October 1, 2015 | 2015/40 Gaz | SG | Rejection |
| September 21, 2015 | 2015/39 Gaz | CN | Rejection |
| August 11, 2015 | 2015/33 Gaz | KR | Rejection |
| April 21, 2015 | 2015/17 Gaz | DE | Rejection |
| December 12, 2014 | 2015/10 Gaz | JP | Correction |
| December 4, 2014 | 2014/49 Gaz | US | Rejection |
| April 2, 2014 | 2014/44 Gaz | JP | Registration |
ID: 141222565