FLEXMOUNT Logo (WIPO, 15.10.2013)
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Die Internationale Marke FLEXMOUNT wurde als Wortmarke am 15.10.2013 bei der Weltorganisation für geistiges Eigentum angemeldet.
| Markenform | Wortmarke |
| Aktenzeichen | 1211547 |
| Länder | 
|
| Basismarke |
Nr. 2013-29284,
18. April 2013
|
| Anmeldedatum | 15. Oktober 2013 |
| Ablaufdatum | 15. Oktober 2023 |
Markeninhaber
4-4-26 Sakuragawa,
Naniwa-ku,
JP
Naniwa-ku,
JP
Markenvertreter
Iwata Tokyu Building, 8th Floor,
2-8, Bakuromachi 3-Chome,
JP
Waren und Dienstleistungen
01
Chemical slurries for polishing semiconductors; chemical
slurries for polishing electronic substrates
03
Abrasive paper (sand paper); abrasive cloth; abrasive sand;
polishing paper; polishing preparations; abrasive
preparations
07
Holding devices for semiconductor wafer surface polishing
machines and apparatus; templates for semiconductor wafer
surface polishing machines and apparatus; blank templates
for semiconductor wafer surface polishing machines and
apparatus; mounting pads and sheets for semiconductor wafer
surface polishing machines and apparatus; polishing pads for
semiconductor wafer surface polishing machines and
apparatus; semiconductor wafer surface polishing machines
and apparatus; parts and accessories of semiconductor wafer
surface polishing machines and apparatus; semiconductor
manufacturing machines and apparatus; holding devices for
glass polishing machines and apparatus; templates for glass
polishing machines and apparatus; blank templates for glass
polishing machines and apparatus; mounting pads and sheets
for glass polishing machines and apparatus; polishing pads
for glass polishing machines and apparatus; glass polishing
machines and apparatus; parts and accessories of glass
polishing machines and apparatus; holding devices for glass
substrate polishing machines and apparatus; templates for
glass substrate polishing machines and apparatus; blank
templates for glass substrate polishing machines and
apparatus; mounting pads and sheets for glass substrate
polishing machines and apparatus; polishing pads for glass
substrate polishing machines and apparatus; glass substrate
polishing machines and apparatus; parts and accessories of
glass substrate polishing machines and apparatus; holding
devices for glass disk polishing machines and apparatus;
templates for glass disk polishing machines and apparatus;
blank templates for glass disk polishing machines and
apparatus; mounting pads and sheets for glass disk polishing
machines and apparatus; polishing pads for glass disk
polishing machines and apparatus; glass disk polishing
machines and apparatus; parts and accessories of glass disk
polishing machines and apparatus; holding devices for metal
polishing machines and apparatus for hard disks; templates
for metal polishing machines and apparatus for hard disks;
blank templates for metal polishing machines and apparatus
for hard disks; mounting pads and sheets for metal polishing
machines and apparatus for hard disks; polishing pads for
metal polishing machines and apparatus for hard disks; metal
polishing machines and apparatus for hard disks; parts and
accessories of metal polishing machines and apparatus for
hard disks; holding devices for polishing machines and
apparatus; templates for polishing machines and apparatus;
blank templates for polishing machines and apparatus;
mounting pads and sheets for polishing machines and
apparatus; polishing pads for polishing machines and
apparatus; polishing machines and apparatus; parts and
accessories of polishing machines and apparatus; polishing
pads for polishing machines, polishing cloth for polishing
machines
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 25. September 2022 | 2022/40 Gaz | US | RAW: Total Invalidation |
| 06. Dezember 2016 | 2017/12 Gaz | CN | Ablehnung |
| 06. Dezember 2016 | 2017/12 Gaz | CN | Ablehnung |
| 06. Dezember 2016 | 2017/12 Gaz | CN | Ablehnung |
| 06. Dezember 2016 | 2017/12 Gaz | CN | Ablehnung |
| 30. November 2016 | 2017/11 Gaz | CN | Ablehnung |
| 10. August 2016 | 2016/33 Gaz | KR | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 23. Mai 2016 | 2016/39 Gaz | CN | Ablehnung |
| 10. März 2016 | 2016/17 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 09. November 2015 | 2015/49 Gaz | CN | Ablehnung |
| 23. September 2015 | 2015/40 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 31. August 2015 | 2015/45 Gaz | JP | RAW: Partial Ceasing Effect |
| 20. April 2015 | 2015/17 Gaz | CN | Ablehnung |
| 02. Januar 2015 | 2015/2 Gaz | KR | Ablehnung |
| 09. Dezember 2014 | 2014/51 Gaz | SG | Ablehnung |
| 19. August 2014 | 2014/34 Gaz | US | Ablehnung |
| 15. Oktober 2013 | JP | Eintragung |
ID: 141211547