N-ETCH

WIPO WIPO 2009

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The International trademark N-ETCH was filed as Word mark on 11/25/2009 at the World Intellectual Property Organization.

Trademark Details Last update: November 27, 2019

Trademark form Word mark
File reference 1026350
Register number 15468
Countries Australia Japan Turkey Belarus China Egypt Spain France Morocco Russia Vietnam
Base trademark LI No. 15468, August 14, 2009
Application date November 25, 2009
Expiration date November 25, 2029

Trademark owner

Bendererstrasse 2
FL-9494 Schaan
LI

goods and services

05 Materials for use in dentistry, namely materials and accessories for the manufacture of impressions, models, inlays; polishing materials for dental use; tooth filling materials; bonding materials; materials for pulp protection and root treatment; dental materials for cavity treatment; materials for the acid etching and for the caries prophylaxis; adhesive agents, protective lacquer for dental use; materials for the restoration of cosmetic deficiency; materials for the diagnosis of plaque and bacteria; composites, dental cements; disinfectant for dental use; preparation for the treatment of caries and parodontosis; colour stains for use in dentistry; cavity lining materials; materials for root treatment; core materials for use in dentistry, repair materials for tooth defects

Trademark history

Date Document number Area Entry
November 25, 2019 2019/48 Gaz Extension
April 26, 2012 2012/17 Gaz JP RAW: Rule 18ter(2)(i) GP following a provisional refusal
March 15, 2012 2012/19 Gaz VN RAW: Rule 18ter(2)(i) GP following a provisional refusal
February 23, 2011 2011/10 Gaz DE Rejection
January 31, 2011 2011/6 Gaz VN Rejection
December 20, 2010 2011/1 Gaz TR Rejection
November 30, 2010 2011/11 Gaz FR Rejection
November 15, 2010 2010/47 Gaz RU Rejection
August 4, 2010 2012/4 Gaz RAW: Limitation
July 15, 2010 2010/30 Gaz JP Rejection
July 12, 2010 2010/31 Gaz DE Rejection
June 15, 2010 2010/26 Gaz AU Rejection
June 8, 2010 2010/24 Gaz ES Rejection
November 25, 2009 2010/3 Gaz LI Registration
Partial deletion

ID: 141026350