NAERO Logo (USPTO, 09/03/2009)
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The US trademark NAERO was filed as Figurative mark on 09/03/2009 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 04/05/2011.
The current status of the mark is "IR CANCELLED; US REGISTRATION CANCELLED".
| Trademark form | Figurative mark |
| File reference | 79074722 |
| Register number | 3939916 |
| Application date | September 3, 2009 |
| Publication date | January 18, 2011 |
| Entry date | April 5, 2011 |
Trademark owner
FI-02200 Espoo
goods and services
7
Machines and machine tools for use in chemical, physical, optical and mechanical processes and production in the field of functional coatings and nanotechnology, namely, for the application, layering and deposition of thin films, coatings, hot aerosol and atomic layers, and for the production of nano particles and functional coatings
9
[ Computers; computer programs for use in chemical, physical, optical and mechanical processes and production in the field of functional surfaces and nanotechnology, namely, for the application, layering and deposition of thin films, coatings, hot aerosol and atomic layers, and for the production of nano particles and functional coatings; computer software for use in chemical, physical, optical and mechanical processes and production in the field of functional surfaces and nanotechnology, namely, for the application, layering and deposition of thin films, coatings, hot aerosol and atomic layers, and for the production of nano particles and functional coatings; and ] measuring and controlling apparatus and instruments, namely, thermometers, barometers, densitometers, viscosity meters, liquid level meters, flow meters, and machine vision applications consisting of cameras, computers, lighting equipment and sensors to optically monitor aerosol, all for use in chemical, physical, optical and mechanical processes and production in the field of functional surfaces and nanotechnology, namely, for the application, layering and deposition of thin films, coatings, hot aerosol and atomic layers, and for the production of nano particles and functional coatings
ID: 1379074722