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The US trademark PHOTOMASTER was filed as Word mark on 03/10/2003 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 12/14/2004.
The current status of the mark is "CANCELLED - SECTION 8".
| Trademark form | Word mark |
| File reference | 78223727 |
| Register number | 2910403 |
| Application date | March 10, 2003 |
| Publication date | September 21, 2004 |
| Entry date | December 14, 2004 |
Trademark owner
1-23, Byulyang-dong
427-040 Kwachon-city, Kyunggi-do
KR
427-040 Kwachon-city, Kyunggi-do
KR
Trademark representatives
goods and services
1
Liquid photoresists for printed circuit board, photosensitive ink, photosensitive resins, liquid photoresists for electronics industry
ID: 1378223727