6
SPUTTERING TARGETS, NAMELY, A FLANGE MADE OF COPPER FOR COOLING DISC-FORMED SILICON CARBIDE SINTERED BODIES AND USED TO FORM A THIN FILM CREATED BY SPUTTERING
7
HIGH STRENGTH, HIGH HARDNESS, HIGH PURITY AND CHEMICAL AND WEAR-RESISTANT MACHINE PARTS, NAMELY, BEARINGS, BUSHINGS, PISTONS, AND CYLINDER LINERS USED FOR MANUFACTURING SEMI-CONDUCTORS; DRY ETCHING MACHINE PARTS, NAMELY DRY ETCHERELECTRODES, RINGS AND PLATES; ION IMPLANTATION MACHINE PARTS, NAMELY, ION IMPLANTER SLIT PARTS, NAMELY, BEARINGS, BUSHES, PISTONS, AND CYLINDER LINERS AND PROTECTION PLATES MADE OF SILICON CARBIDE OR HIGH PURITY SILICON CARBIDE CERAMIC; CHEMICAL VAPOR DEPOSITION MACHINE PARTS, NAMELY, PLATES, SUSCEPTORS AND RINGS MADE OF SILICON CARBIDE OR HIGH PURITY SILICON CARBIDE CERAMIC; ANALYZING MACHINE PARTS, NAMELY, HOLDERS, RECEPTACLES AND RINGS; ULTRA-SONIC VIBRATORS, NAMELY VIBRATORS FOR ULTRA-SONIC CLEANER OR ULTRA-SONIC SPRAYER USING VARIOUS ACID OR ALKALI SOLUTIONS FOR USE IN ASSOCIATION WITH CLEANING MACHINE PARTS
9
DUMMY WAFERS USED IN THE PROCESSING OF SILICON WAFERS
11
ELECTRIC HEATERS
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