7
SEMICONDUCTOR MANUFACTURING MACHINES, NAMELY, OPTICAL EDGE BEAD REMOVAL SYSTEMS USING EITHER A FLOOD EXPOSURE SYSTEM OR A FIBER OPTIC CABLES IN COMBINATION WITH AN EDGE TRACKING HEAD FOR EXPOSING PHOTO RESIST ALONG THE EDGE PORTIONS OF WAFERS; AND DISK DRIVE MEDIA TRANSPORT SYSTEMS COMPOSED OF CONVEYORS AND INDUSTRIAL ROBOTS FOR MOVING THE MEDIA INTO AND OUT OF SEMICONDUCTOR PROCESSING MACHINES
9
METERS AND PROBES FOR THE MEASUREMENT AND ANALYSIS OF ULTRAVIOLET LIGHT; LASER METERS FOR MEASURING PULSE ENERGY IN PHOTOLITHOGRAPHY STEPPERS OR STEP AND SCAN SYSTEMS IN THE PROCESSING OF SEMICONDUCTORS; AND MASK ALIGNERS FOR ALIGNING SUBSTRATES AND MASKS FOR EXPOSURE TO ULTRAVIOLET LIGHT FOR IN THE PROCESSING OF SEMICONDUCTORS
11
ULTRAVIOLET LIGHT SOURCES AND COMPONENTS THEREOF, ALL SOLD AS A UNIT FOR USE IN THE PROCESSING OF SEMICONDUCTORS, NAMELY ELECTRIC POWER SUPPLIES, ULTRAVIOLET LIGHTS, SHUTTERS AND TIMERS; FLOOD EXPOSURE SYSTEMS COMPOSED OF LAMPS, REFLECTORS, MIRRORS, SHUTTERS, OPTICAL INTEGRATORS AND COLLIMATING LENSES FOR EXPOSING OBJECTS TO A FIELD OF UNIFORM ULTRAVIOLET LIGHT IN PHOTOLITHOGRAPHIC PROCESSING OF SEMICONDUCTORS
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