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Die US-Marke BARRACUDA wurde als Wortmarke am 20.06.2000 beim Amerikanischen Patent- und Markenamt angemeldet.
Sie wurde am 12.11.2002 im Markenregister eingetragen.
Der aktuelle Status der Marke ist "CANCELLED - SECTION 8".
| Markenform | Wortmarke |
| Aktenzeichen | 76075632 |
| Registernummer | 2648048 |
| Anmeldedatum | 20. Juni 2000 |
| Veröffentlichungsdatum | 20. August 2002 |
| Eintragungsdatum | 12. November 2002 |
Markeninhaber
Carl-Benz-Strasse 10
72124 Pliezhausen
DE
72124 Pliezhausen
DE
Markenvertreter
Waren und Dienstleistungen
7
Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces
37
Installation and maintenance of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; Machines and systems for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces
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ID: 1376075632