POSEIDON STT

USPTO USPTO 1997 CANCELLED - SECTION 8

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Die US-Marke POSEIDON STT wurde als Bildmarke am 18.12.1997 beim Amerikanischen Patent- und Markenamt angemeldet.
Sie wurde am 02.03.1999 im Markenregister eingetragen. Der aktuelle Status der Marke ist "CANCELLED - SECTION 8".

Markendetails Letztes Update: 07. Mai 2018

Markenform Bildmarke
Aktenzeichen 75408197
Registernummer 2228092
Anmeldedatum 18. Dezember 1997
Veröffentlichungsdatum 08. Dezember 1998
Eintragungsdatum 02. März 1999

Markeninhaber

Carl-Benz-Strasse 10
72124 Pliezhausen
DE

Markenvertreter

Waren und Dienstleistungen

7 machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and/or solar cells; machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts
11 drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
37 Installation and servicing of the following machines and units - machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and/or solar cells; machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts; drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
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ID: 1375408197