STEAG MICROTECH Logo (USPTO, 03/13/1995)
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The US trademark STEAG MICROTECH was filed as Figurative mark on 03/13/1995 at the U.S. Patent and Trademark Office.
It was registered as a trademark on 04/29/1997.
The current status of the mark is "CANCELLED - SECTION 7".
| Trademark form | Figurative mark |
| File reference | 74646203 |
| Register number | 2056612 |
| Application date | March 13, 1995 |
| Publication date | February 4, 1997 |
| Entry date | April 29, 1997 |
Trademark owner
CARL-BENZ-STRASSE 10
72124 PLIEZHAUSEN
DE
72124 PLIEZHAUSEN
DE
Trademark representatives
goods and services
7
mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-Roms and solar cells; drying and wet processing apparatus for treating semiconductor susbstrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-Roms and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor
37
installation and maintenance for others of the following items - mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells; drying and wet processing apparatus for treating semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor
ID: 1374646203