EDWARDS

WIPO WIPO 2007

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Die Internationale Marke EDWARDS wurde als Wortmarke am 17.10.2007 bei der Weltorganisation für geistiges Eigentum angemeldet.

Markendetails Letztes Update: 15. Februar 2023

Markenform Wortmarke
Aktenzeichen 974862
Länder Australien Schweiz China Europäische Gemeinschaft Japan Südkorea Russland Singapur Vereinigte Staaten von Amerika (USA) Vietnam
Basismarke GB Nr. 2453957, 27. April 2007
Anmeldedatum 17. Oktober 2007
Ablaufdatum 17. Oktober 2027

Markeninhaber

Innovation Drive
Burgess Hill, West Sussex RH15 9TW
GB

Markenvertreter

The Tannery, 91 Kirkstall Road GB

Waren und Dienstleistungen

04 Oils, namely mineral oils, silicone oils, synthetic oils and perfluoropolyether oils; lubricants; silicon sealants and greases used for sealing vacuum parts; greases
06 Flanges; flange fittings; clamps; commercial containers of metal for transporting semiconductor processing equipment
07 Vacuum apparatus and vacuum machines all included in this class; vacuum pumps; oil sealed pumps; rotary vane pumps; oil sealed rotary pumps; oil sealed piston pumps; booster pumps; scroll pumps; dry pumps; dry vacuum pumps; liquid ring vacuum pumps; industrial dry pumps; diaphragm pumps; jet pumps; turbomolecular pumps; compound molecular pumps; regenerative pumps; vapour pumps; diffusion pumps; chemical pumps; chemical dry pumps; chemical dry vacuum pumps; chemical pumping systems; vacuum shelf dryers; steam ejector vacuum machines and equipment; exhaust gas management apparatus and equipment; apparatus for controlling the temperature of exhaust gas pipes; pump controllers; valves; valve controllers; chemical blending apparatus and delivery system and point of use chemical blending apparatus and delivery system; apparatus and system for blending and distribution of chemical mechanical polishing slurries; parts and fittings for all the aforesaid goods
09 Scientific apparatus, spectrograph apparatus, mass spectrometers, instruments and apparatus for use in testing, control, detection, monitoring and the analysis of materials in scientific and industrial operations, pressure gauges; pressure regulators; apparatus and instruments all for detecting fluid leaks; ionisation gauges, vacuum gauges, convection gauges; pirani gauges; penning gauges; ion gauges; magnetron gauges; inverted magnetron gauges; wide range gauges; thermocouple gauges; strain gauges; transducers; controllers for gauges; capsule dial gauges; gas sensors; moisture sensors; calibration apparatus, instruments and equipment; de-aerating apparatus; accelerated ion devices including devices for coating substrates; apparatus for thin-film deposition; vacuum deposition technology apparatus, instruments and equipment; vapour deposition apparatus, instruments and equipment; electron beam deposition apparatus, instruments and equipment; electron beam furnace equipment, electron beam evaporation equipment, electron beam annealing equipment, electron beam surface conditioning equipment sputtering apparatus, instruments and equipment; electric valves; electronic valves; electrical power supplies; parts and fittings for all the aforesaid goods; computer software for monitoring system status and providing data relating to vacuum, exhaust abatement, chemical use and gas use, relating to the manufacture of semiconductors and integrated circuits; computer software for designing and configuring gas, chemical, vacuum and exhaust management systems; on line particle size analytical device for use in chemical mechanical polishing system
11 Installations and apparatus for refrigerating, cooling and chilling; installations and apparatus for the treatment, purification and disposal of solid, liquid, and gaseous matter; water purification units; water treatment units; installations and apparatus for igniting, heating, burning and scrubbing gas; installations and apparatus for cleaning exhaust gases from the semiconductor industry; gas abatement apparatus; integrated gas pumping and abatement apparatus; gas scrubbing apparatus; wet scrubbers; water cooled traps; traps for collection or removal of semiconductor process exhaust products; filter traps, gas reactors; gas recovery apparatus; gas separating apparatus; and parts and fittings for all the aforesaid goods
37 Repair and maintenance of semiconductor processing equipment, exhaust gas management systems, chemical distribution systems, water treatment systems, heat exchangers, chillers, vacuum apparatus and vacuum pumps and parts and fittings therefor; refurbishment of semiconductor processing equipment; consultancy and advisory services for the installation and maintenance of apparatus for the provision of gases and gas mixtures, chemicals, vacuum and/or exhaust management in the manufacture of semiconductors and similar devices
40 Consultancy and advisory services for the modification of apparatus for the provision of gases and gas mixtures, chemicals, vacuum and/or exhaust management in the manufacture of semiconductors and similar devices
41 Consultancy and arranging of seminars in the field of vacuum and exhaust management engineering; training services for the design, installation, modification, calibration, operation, application and maintenance of apparatus for the provision of gases and gas mixtures, chemicals, vacuum and/or exhaust management in the manufacture of semiconductors and similar devices
42 Consultancy, design, advisory services for the design and calibration of apparatus for the provision of gases and gas mixtures, chemicals, vacuum and/or exhaust management in the manufacture of semiconductors and similar devices
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen

Markenhistorie

Datum Belegnummer Bereich Eintrag
17. Oktober 2017 2017/42 Gaz Verlängerung
11. August 2016 2017/27 Gaz CN RAW: Rule 18ter(4) all goods and services protected
14. März 2013 2013/11 Gaz AU RAW: Rule 18ter(2)(ii) GP following a provisional refusal
21. Oktober 2010 2013/4 Gaz KR RAW: Rule 18ter(2)(ii) GP following a provisional refusal
13. September 2010 2013/4 Gaz US RAW: Rule 18ter(2)(ii) GP following a provisional refusal
16. März 2010 2010/29 Gaz RAW: Limitation
28. Januar 2010 2010/7 Gaz CN Ablehnung
07. Januar 2010 2013/2 Gaz JP RAW: Rule 18ter(2)(ii) GP following a provisional refusal
11. Dezember 2009 2009/51 Gaz KR Ablehnung
10. August 2009 2009/33 Gaz EM RAW: Protection Granted
09. Juli 2009 2009/29 Gaz JP Ablehnung
15. Juni 2009 2009/36 Gaz SG RAW: Final Reversing Refusal
27. April 2009 2009/19 Gaz KR Ablehnung
29. Oktober 2008 2008/46 Gaz AU Ablehnung
27. Oktober 2008 2008/46 Gaz SG Ablehnung
01. Oktober 2008 2008/40 Gaz US Ablehnung
17. Oktober 2007 2008/37 Gaz GB Eintragung

ID: 14974862