Quartron

WIPO WIPO 2007

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Die Internationale Marke Quartron wurde als Wortmarke am 26.11.2007 bei der Weltorganisation für geistiges Eigentum angemeldet.

Markendetails Letztes Update: 20. März 2018

Markenform Wortmarke
Aktenzeichen 957614
Registernummer 4702687
Länder China Europäische Gemeinschaft Südkorea Vereinigte Staaten von Amerika (USA)
Basismarke JP Nr. 4702687, 22. August 2003
Anmeldedatum 26. November 2007
Ablaufdatum 26. November 2027

Markeninhaber

3-10, Koraibashi 4-chome,
Chuo-ku, Osaka-city
JP

Markenvertreter

1-3, Dojimahama 2-Chome, Kita-ku, Osaka-City JP

Waren und Dienstleistungen

01 Chemicals for industrial purpose; silica sol for industrial purpose; organo silica sol for industrial purpose; chemical silica for industrial purpose such as globular silica, hollow silica, porous silica and mesoporous silica; alkoxysilane for industrial purpose such as methyl silicate, propyle silicate and fused silicate; organic acid for industrial purpose such as citric acid and malic acid; silica compound composed of silica and oxides except for silica oxides, such as titania coated silica and silica coated titania; silica compound composed of organic substances and silica; coating agents consisting of colloidal silica for forming antireflection film; antireflection coating agents; silica type coating agents; chemicals for use in manufacture of paints and inks; chemicals for use in plastics molding; anti-static preparations except for household use; detergents for use in manufacturing processes; detergents for metal substrates for use in manufacturing semi-conductors; detergents for semi-conductors; auxiliary fluid for use with abrasives; coolants for industrial purpose; coolants for use in cutting with wire saws; mold-release preparations; unsticking and separating preparations; soil improving agents; finishing preparations for use in the manufacture of steel.
03 Abrasive cloth; abrasive sheets; abrasive paper; abrasives except for hand tool use; abrasive slurry; abrasive slurry for polishing of chemical processing machines; abrasives for semi-conductors; abrasives for semi-conductor wafers; furbishing preparations except for auxiliary fluid for use with abrasives and dental abrasives; abrasive grains; fixed abrasive grains.
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen

Markenhistorie

Datum Belegnummer Bereich Eintrag
04. Oktober 2017 2017/48 Gaz Verlängerung
15. Juli 2016 2017/16 Gaz US RAW: Partial Invalidation
04. Mai 2012 2012/21 Gaz EM RAW: Rule 18ter(2)(ii) GP following a provisional refusal
14. April 2010 2013/3 Gaz US RAW: Rule 18ter(2)(ii) GP following a provisional refusal
19. Juni 2009 2009/28 Gaz KR Entscheidung zu Widerspruch
16. März 2009 2009/12 Gaz EM Ablehnung
16. März 2009 2009/12 Gaz EM Ablehnung
02. Februar 2009 2009/8 Gaz KR Ablehnung
28. April 2008 2008/18 Gaz US Ablehnung
26. November 2007 JP Eintragung

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