TESCAN ORSAY Logo (WIPO, 17.06.2015)
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Die Internationale Marke TESCAN ORSAY wurde als Wortmarke am 17.06.2015 bei der Weltorganisation für geistiges Eigentum angemeldet.
| Markenform | Wortmarke |
| Aktenzeichen | 1274088 |
| Länder | 
|
| Basismarke |
Nr. 521122,
26. März 2015
|
| Anmeldedatum | 17. Juni 2015 |
| Ablaufdatum | 17. Juni 2025 |
Markeninhaber
Markenvertreter
Koliště 1965/13a
602 00 Brno
CZ
Waren und Dienstleistungen
07
Electrical devices and machine tools for the manufacture of
semiconductor parts, displays, data storage components, and
objects for scientific research use, namely, electron and
ion columns, namely, focused electron beam columns for
electron lithography, electron beam microscopy and analysis,
focused ion beam columns for ion lithography, imaging, and
ion milling, secondary ion mass spectrometry; accessories
for the above mentioned electrical devices and machine tools
for use in the manufacture of semiconductor parts, displays,
data storage components, and objects for scientific research
use, such as, sample preparation equipment, namely equipment
for preparation of samples to be machined or analysed by
some of the above mentioned devices and machine tools
09
Microscopes, namely, electron microscopes, scanning electron
microscopes, transmission electron microscopes, ion
microscopes, raman microscopes, atomic force microscopes,
holographic microscopes; scientific apparatus, namely
electron sources for microscopes; scientific apparatus in
the nature of ion sources for microscopes, namely,
liquid-metal ion sources and plasma sources; focused ion
beam tools and electron beam tools, namely, instruments for
material deposition and removal and for imaging, analysis,
and measurement of materials in the fields of microscopy and
nanotechnology; optical apparatus, namely, electron beam
lithography device; scientific instruments, namely, particle
analyzers and classification instruments in the field of
mineralogy; spectrometry scientific apparatus and
instruments, namely, time-of-flight secondary ion mass
spectrometry systems, X-ray and visible light spectrometry
systems; lasers for nonmedical purposes; optical apparatus
and instruments, namely, optical prisms, optical lenses,
optical fibres, optical cables, optical mirrors; diaphragms
for scientific apparatus; measuring instruments, namely,
micrometer gauges; parts and fittings for all the aforesaid
goods, namely, electron and ion detectors for electron and
ion beam systems, electron detectors, secondary ions
detectors, back scattered electron detectors, X-ray
detectors, cathodoluminiscence detectors; parts and fittings
for all the aforesaid scientific instruments namely,
diffraction apparatus and diffraction detectors for
microscopes, electron multipliers, photo multipliers,
amplifiers, gas injection systems, electron flood guns,
stages and nanomanipulators for microscopes,
decontaminators, vacuum systems and gauges; microscopic
system navigational software, namely, software that enhances
the navigational, functional capability of microscopic,
analytic, lithographic and spectroscopic components
separately and/or in integrated systems; application
software and operation system software for operation of all
the foregoing equipment separately and/or in integrated
systems, namely, software for use in microscopic imaging,
milling, deposition and analysis; image processing software
37
Service, maintenance and repair of microscopes, namely,
electron microscopes, scanning electron microscopes,
transmission electron microscopes, ion microscopes, raman
microscopes, atomic force microscopes, holographic
microscopes; service, maintenance and repair of scientific
apparatus, namely, electron sources for microscopes, ion
sources for microscopes, namely, liquid-metal ion sources
and plasma sources; service, maintenance and repair of
focused ion beam tools and electron beam tools, namely,
instruments for material deposition and removal and for
imaging, analysis, and measurement of materials in the
fields of microscopy and nanotechnology; service,
maintenance and repair of electron beam lithography
apparatus; service, maintenance and repair of particle
analyzers and classification instruments in the field of
mineralogy; service, maintenance and repair of spectrometry
systems, namely, time-of-flight secondary ion mass
spectrometry systems, X-ray and visible light spectrometry
systems; service, maintenance and repair of lasers and
optical apparatus and instruments, namely, optical prisms,
optical lenses, optical fibres, optical cables, optical
mirrors; service, maintenance and repair of diaphragms for
scientific apparatus; service, maintenance and repair of
measuring instruments, namely, micrometer gauges; service,
maintenance and repair of detectors for electron and ion
beam systems, electron detectors, secondary ions detectors,
back scattered electron detectors, X-ray detectors,
cathodoluminiscence detectors; service, maintenance and
repair of diffraction apparatus and diffraction detectors
for microscopes, electron multiplier tubes, photo
multipliers, amplifiers, gas injection systems, electron
flood guns, stages and nanomanipulators for microscopes,
decontaminators, vacuum systems and gauges
42
Design, development and research services of the charged
particle optical systems, namely electron microscopes,
scanning electron microscopes, transmission electron
microscopes, ion microscopes, raman microscopes, atomic
force microscopes, holographic microscopes
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 16. Mai 2019 | 2019/22 Gaz | PH | RAW: Total Invalidation |
| 03. Januar 2018 | 2018/5 Gaz | IL | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 17. April 2017 | 2017/16 Gaz | IN | Ablehnung |
| 11. April 2017 | 2017/16 Gaz | RU | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 23. Februar 2017 | 2017/10 Gaz | IL | Ablehnung |
| 18. Januar 2017 | 2017/8 Gaz | KZ | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 18. Oktober 2016 | 2016/43 Gaz | KR | Ablehnung |
| 11. Oktober 2016 | 2016/42 Gaz | IR | Ablehnung |
| 11. Oktober 2016 | 2016/42 Gaz | TR | Ablehnung |
| 23. September 2016 | 2016/40 Gaz | RU | Ablehnung |
| 21. September 2016 | 2016/39 Gaz | EM | Ablehnung |
| 25. Juli 2016 | 2016/32 Gaz | KZ | Ablehnung |
| 04. Juli 2016 | 2016/32 Gaz | CN | Ablehnung |
| 17. Mai 2016 | 2016/21 Gaz | KR | Ablehnung |
| 28. April 2016 | 2016/20 Gaz | PH | Ablehnung |
| 18. Februar 2016 | 2016/8 Gaz | AU | Ablehnung |
| 17. Juni 2015 | 2015/45 Gaz | CZ | Eintragung |
ID: 141274088