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Die Internationale Marke EPIREVO wurde als Wortmarke am 02.04.2014 bei der Weltorganisation für geistiges Eigentum angemeldet.
| Markenform | Wortmarke |
| Aktenzeichen | 1222565 |
| Länder | 
|
| Basismarke |
Nr. 2013-090953,
20. November 2013
|
| Anmeldedatum | 02. April 2014 |
| Ablaufdatum | 02. April 2024 |
Markeninhaber
8-1, Shinsugita-cho, Isogo-ku,
Yokohama-shi
JP
Yokohama-shi
JP
Markenvertreter
TERASAKI BLDG. No. 2, 4th Fl.,
12-15, Nihonbashi-Muromachi 1-Chome,
JP
Waren und Dienstleistungen
07
Apparatus for depositing on semiconductor wafers; apparatus
for performing epitaxial growth on semiconductor wafers;
apparatus for forming compound semiconductor films on
semiconductor wafers; Metal Organic Chemical Vapor
Deposition (MOCVD) apparatus; Chemical Vapor Deposition
(CVD) apparatus; etching apparatus; other semiconductor
manufacturing apparatus; apparatus and devices used for the
aforesaid apparatus, namely, reduced pressure control
apparatus, temperature control apparatus, rotation control
apparatus, other control apparatus, gas supply apparatus,
exhaust gas treatment apparatus, wafer carrier devices,
wafer carrier robots, wafer cleaning apparatus, temperature
measuring devices, wafer curvature measuring apparatus;
parts, accessories and pipes for the aforesaid goods
37
Repair, maintenance and installation of apparatus for
depositing on semiconductor wafers, apparatus for performing
epitaxial growth on semiconductor wafers, apparatus for
forming compound semiconductor films on semiconductor
wafers, Metal Organic Chemical Vapor Deposition (MOCVD)
apparatus, Chemical Vapor Deposition (CVD) apparatus,
etching apparatus, other semiconductor manufacturing
apparatus and parts, accessories and pipes therefor; repair,
maintenance and installation of apparatus and devices used
for semiconductor manufacturing apparatus, namely, reduced
pressure control apparatus, temperature control apparatus,
rotation control apparatus, other control apparatus, gas
supply apparatus and their parts, exhaust gas treatment
apparatus and their parts, wafer carrier devices, wafer
carrier robots, wafer cleaning apparatus, temperature
measuring devices, wafer curvature measuring apparatus and
parts, accessories and pipes for the aforesaid apparatus and
devices; information supply with regards to repair,
maintenance and installation of the aforesaid apparatus and
devices, their parts, accessories and pipes
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 29. August 2016 | 2016/37 Gaz | IN | Ablehnung |
| 27. Mai 2016 | 2016/35 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 02. Dezember 2015 | 2015/49 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 01. Oktober 2015 | 2015/40 Gaz | SG | Ablehnung |
| 21. September 2015 | 2015/39 Gaz | CN | Ablehnung |
| 11. August 2015 | 2015/33 Gaz | KR | Ablehnung |
| 21. April 2015 | 2015/17 Gaz | DE | Ablehnung |
| 12. Dezember 2014 | 2015/10 Gaz | JP | Korrektur |
| 04. Dezember 2014 | 2014/49 Gaz | US | Ablehnung |
| 02. April 2014 | 2014/44 Gaz | JP | Eintragung |
ID: 141222565