WONIK IPS

WIPO WIPO 2011

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Die Internationale Marke WONIK IPS wurde als Bildmarke am 16.03.2011 bei der Weltorganisation für geistiges Eigentum angemeldet.

Logodesign (Wiener Klassifikation)

#Natürliche Phänomene #Briefe, die eine besondere Form des Schreibens darstellen #Farben #Wirbel, Drehbewegungen, Tornados #Buchstabenreihen in verschiedenen Dimensionen #Drei vorherrschende Farben

Markendetails Letztes Update: 21. September 2022

Markenform Bildmarke
Aktenzeichen 1093207
Länder China Deutschland Frankreich Großbritannien Japan Singapur Vereinigte Staaten von Amerika (USA)
Basismarke KR Nr. , 23. November 2024
Anmeldedatum 16. März 2011
Ablaufdatum 16. März 2031

Markeninhaber

20, PANGYO-RO 255BEON-GIL,
BUNDANG-GU
KR

Markenvertreter

5th Floor, KDIC Bldg., 30 Cheonggyecheon-ro, KR

Waren und Dienstleistungen

07 Thin film deposition apparatus; sputtering apparatus; etcher; evaporation deposition apparatus; plasma chemical vapor deposition apparatus; coupled plasma chemical vapor deposition apparatus; atomic layer deposition apparatus; ion beam deposition apparatus; ion beam etcher; annealing apparatus; rapid thermal processing apparatus; low temperature annealing apparatus; coupled sputtering apparatus; multipole sputtering apparatus; laser sublimation deposition apparatus; organic molecular chemical vapor deposition apparatus; thin film deposition apparatus for manufacturing semiconductor; sputtering apparatus for manufacturing semiconductor; coupled sputtering apparatus for manufacturing semiconductor; etcher for manufacturing semiconductor; evaporation deposition apparatus for manufacturing semiconductor; plasma chemical vapor deposition apparatus for manufacturing semiconductor; atomic layer deposition apparatus for manufacturing semiconductor; ion beam deposition apparatus for manufacturing semiconductor; ion beam etcher for manufacturing semiconductor; electron beam annealing apparatus for manufacturing semiconductor; rapid thermal processing apparatus for manufacturing semiconductor; thin film deposition apparatus for manufacturing liquid crystal display; sputtering apparatus for manufacturing liquid crystal display; coupled sputtering apparatus for manufacturing liquid crystal display; etcher for manufacturing liquid crystal display; evaporation deposition apparatus for manufacturing liquid crystal display; plasma chemical vapor deposition apparatus for manufacturing liquid crystal display; ion beam deposition apparatus for manufacturing liquid crystal display; ion beam etcher for manufacturing liquid crystal display; annealing apparatus for manufacturing liquid crystal display; thin film deposition apparatus for manufacturing organic electro luminescence display; sputtering apparatus for manufacturing organic electro luminescence display; coupled sputtering apparatus for manufacturing organic electro luminescence display; etcher for manufacturing organic electro luminescence display; evaporation deposition apparatus for manufacturing organic electro luminescence display; plasma chemical vapor deposition apparatus for manufacturing organic electro luminescence display; ion beam deposition apparatus for manufacturing organic electro luminescence display; ion beam etcher for manufacturing organic electro luminescence display; annealing apparatus for manufacturing organic electro luminescence display; thin film deposition apparatus for manufacturing plasma display panel; sputtering apparatus for manufacturing plasma display panel; coupled sputtering apparatus for manufacturing plasma display panel; etcher for manufacturing plasma display panel; evaporation deposition apparatus for manufacturing plasma display panel; ion beam deposition apparatus for manufacturing plasma display panel; ion beam etcher for manufacturing plasma display panel; annealing apparatus for manufacturing plasma display panel; thin film deposition apparatus for manufacturing solar cell; sputtering apparatus for manufacturing solar cell; coupled sputtering apparatus for manufacturing solar cell; etcher for manufacturing solar cell; evaporation deposition apparatus for manufacturing solar cell; plasma chemical vapor deposition apparatus for manufacturing solar cell; rapid thermal processing apparatus for manufacturing solar cell; ion beam deposition apparatus for manufacturing solar cell; ion beam etcher for manufacturing solar cell; annealing apparatus for manufacturing solar cell; thin film deposition apparatus for manufacturing LED; chemical vapor deposition apparatus for manufacturing LED; thin film deposition apparatus for manufacturing MEMS; sputtering apparatus for manufacturing MEMS; evaporation deposition apparatus for manufacturing MEMS; chemical vapor deposition apparatus for manufacturing MEMS; ion beam generation apparatus; ion beam sputter deposition apparatus; ion beam etcher; ion beam assisted deposition apparatus; electron beam generation systems; electron beam assisted deposition apparatus; electron beam crystallization apparatus; electron beam annealing apparatus; liquid crystal injection apparatus for manufacturing liquid crystal display device; thin film apparatus for manufacturing organic electroluminescence display; bonding apparatus for manufacturing organic electroluminescence display device; coater for mainly manufacturing semiconductor, liquid crystal display panel, etc.; developer for mainly manufacturing semiconductor, liquid crystal display panel, etc.; etcher for mainly manufacturing semiconductor, liquid crystal display panel, etc.; wafer loading mechanical apparatus for mainly manufacturing semiconductor, liquid crystal display panel, etc.; oxidation mechanical apparatus for manufacturing semiconductor; ion implantation apparatus for manufacturing semiconductor; chemical vapor precipitation mechanical apparatus for manufacturing semiconductor; sputtering mechanical apparatus for mainly manufacturing semiconductor, liquid crystal display panel, etc.; probe for mainly manufacturing semiconductor, liquid crystal display panel, etc.; mechanical apparatus for manufacturing liquid crystal display; deposition apparatus for manufacturing semiconductor, etc.; deposition apparatus for manufacturing liquid crystal display panel; thin film deposition apparatus for manufacturing liquid crystal display panel; sputtering apparatus for manufacturing LED; coupled sputtering apparatus for manufacturing LED; etcher for manufacturing LED; evaporation deposition apparatus for manufacturing LED; plasma chemical vapor deposition apparatus for manufacturing LED; ion beam deposition apparatus for manufacturing LED; ion beam etcher for manufacturing LED; electron beam annealing apparatus for manufacturing LED; thin film deposition apparatus for manufacturing AMOLED display; sputtering apparatus for manufacturing AMOLED display; coupled sputtering apparatus for manufacturing AMOLED display; etcher for manufacturing AMOLED display; evaporation deposition apparatus for manufacturing AMOLED display; plasma chemical vapor deposition apparatus for manufacturing AMOLED display; ion beam deposition annealing apparatus for manufacturing AMOLED display
37 Semiconductor processing machine repair; semiconductor wafer processing apparatus repair; atomic layer deposition apparatus repair; low pressure chemical vapor deposition apparatus repair; diffusion furnace repair; plasma chemical vapor deposition apparatus repair; metal organic chemical vapor deposition apparatus repair; fast-heating processing apparatus repair; high temperature chemical vapor deposition apparatus repair; vapor epitaxy repair; liquid epitaxy repair; normal pressure chemical vapor deposition apparatus repair; mid pressure chemical vapor deposition apparatus repair; deposition apparatus repair for apparatus for manufacturing semiconductor; etcher repair for manufacturing semiconductor; sputtering apparatus repair for manufacturing semiconductor; photolithography apparatus repair for manufacturing semiconductor; developer repair for manufacturing semiconductor; ashing apparatus repair for manufacturing semiconductor; cleaning apparatus repair for manufacturing semiconductor; polishing apparatus repair for manufacturing semiconductor; deposition apparatus repair for manufacturing liquid crystal display panel; etcher repair for manufacturing liquid crystal display panel; sputtering apparatus repair for manufacturing liquid crystal display panel; photolithography apparatus repair for manufacturing liquid crystal display panel; developer repair for manufacturing liquid crystal display panel; ashing apparatus repair for manufacturing liquid crystal display panel; cleaning apparatus repair for manufacturing liquid crystal display panel; polishing apparatus repair for manufacturing liquid crystal display panel; deposition apparatus repair for manufacturing solar cell; etcher repair for manufacturing solar cell; sputtering apparatus repair for manufacturing solar cell; photolithography apparatus repair for manufacturing solar cell; developer repair for manufacturing solar cell; ashing apparatus repair for manufacturing solar cell; cleaning apparatus repair for manufacturing solar cell; polishing apparatus repair for manufacturing solar cell; semiconductor processing machine installation; semiconductor wafer processing apparatus installation; ALD(atomic layer deposition apparatus) installation; low pressure chemical vapor deposition apparatus installation; diffusion furnace installation; plasma chemical vapor deposition apparatus installation; metal organic chemical vapor deposition apparatus installation; fast-heating processing apparatus installation; high temperature chemical vapor deposition apparatus installation; vapor epitaxy installation; liquid epitaxy installation; normal pressure chemical vapor deposition apparatus installation; mid pressure chemical vapor deposition apparatus installation; deposition apparatus installation for manufacturing semiconductor; etcher installation for manufacturing semiconductor; sputtering apparatus installation for manufacturing semiconductor; photolithography apparatus installation for manufacturing semiconductor; developer installation for manufacturing semiconductor; ashing apparatus installation for manufacturing semiconductor; cleaning apparatus installation for manufacturing semiconductor; polishing apparatus installation for manufacturing semiconductor; deposition apparatus installation for manufacturing liquid crystal display panel; etcher installation for manufacturing liquid crystal display panel; sputtering apparatus installation for manufacturing liquid crystal display panel; photolithography apparatus installation for manufacturing liquid crystal display panel; developer installation for manufacturing liquid crystal display panel; ashing apparatus installation for manufacturing liquid crystal display panel; cleaning apparatus installation for manufacturing liquid crystal display panel; polishing apparatus installation for manufacturing liquid crystal display panel; deposition apparatus installation for manufacturing solar cell; etcher installation for manufacturing solar cell; sputtering apparatus installation for manufacturing solar cell; photolithography apparatus installation for manufacturing solar cell; developer installation for manufacturing solar cell; ashing for manufacturing solar cell apparatus installation; cleaning apparatus installation for manufacturing solar cell; polishing apparatus installation for manufacturing solar cell; semiconductor processing machine maintenance; semiconductor wafer processing apparatus maintenance; ALD (atomic layer deposition apparatus) maintenance; low pressure chemical vapor deposition apparatus maintenance; diffusion furnace maintenance; plasma chemical vapor deposition apparatus maintenance; metal organic chemical vapor deposition apparatus maintenance; fast-heating processing apparatus maintenance; high temperature chemical vapor deposition apparatus maintenance; vapor epitaxy maintenance; liquid epitaxy maintenance; normal pressure chemical vapor deposition apparatus maintenance; mid pressure chemical vapor deposition apparatus maintenance; deposition apparatus maintenance for manufacturing semiconductor; etcher maintenance for manufacturing semiconductor; sputtering apparatus maintenance for manufacturing semiconductor; photolithography apparatus maintenance for manufacturing semiconductor; developer maintenance for manufacturing semiconductor; ashing apparatus maintenance for manufacturing semiconductor; cleaning apparatus maintenance for manufacturing semiconductor; polishing apparatus maintenance for manufacturing semiconductor; deposition apparatus maintenance for manufacturing liquid crystal display panel; etcher maintenance for manufacturing liquid crystal display panel; sputtering apparatus maintenance for manufacturing liquid crystal display panel; photolithography apparatus maintenance for manufacturing liquid crystal display panel; developer maintenance for manufacturing liquid crystal display panel; ashing apparatus maintenance for manufacturing liquid crystal display panel; cleaning apparatus maintenance for manufacturing liquid crystal display panel; polishing apparatus maintenance for manufacturing liquid crystal display panel; deposition apparatus maintenance for manufacturing solar cell; etcher maintenance for manufacturing solar cell; sputtering apparatus maintenance for manufacturing solar cell; photolithography apparatus maintenance for manufacturing solar cell; developer maintenance for manufacturing solar cell; ashing apparatus maintenance for manufacturing solar cell; cleaning apparatus maintenance for manufacturing solar cell; polishing apparatus maintenance for manufacturing solar cell; deposition apparatus maintenance for manufacturing LED; etcher maintenance for manufacturing LED; sputtering apparatus maintenance for manufacturing LED; photolithography apparatus maintenance for manufacturing LED; developer maintenance for manufacturing LED; ashing apparatus maintenance for manufacturing LED; cleaning apparatus maintenance for manufacturing LED; polishing apparatus maintenance for manufacturing LED; deposition apparatus maintenance for manufacturing AMOLED display; etcher maintenance for manufacturing AMOLED display; sputtering apparatus maintenance for manufacturing AMOLED display; photolithography apparatus maintenance for manufacturing AMOLED display; developer maintenance for manufacturing AMOLED display; ashing apparatus maintenance for manufacturing AMOLED display; cleaning apparatus maintenance for manufacturing AMOLED display; polishing apparatus maintenance for manufacturing AMOLED display
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen

Markenhistorie

Datum Belegnummer Bereich Eintrag
11. März 2021 2021/15 Gaz Verlängerung
27. März 2019 2019/16 Gaz US RAW: Partial Invalidation
13. April 2015 KR RAW: Partial Ceasing Effect
16. Mai 2014 2014/22 Gaz SG RAW: Rule 18ter(2)(ii) GP following a provisional refusal
11. Juli 2013 2013/28 Gaz JP RAW: Rule 18ter(2)(i) GP following a provisional refusal
17. Dezember 2012 2012/51 Gaz US RAW: Rule 18ter(2)(ii) GP following a provisional refusal
26. November 2012 RAW: Limitation
13. September 2012 2012/37 Gaz JP Ablehnung
13. August 2012 2012/33 Gaz CN Ablehnung
21. März 2012 2012/12 Gaz DE Ablehnung
20. Februar 2012 2012/8 Gaz GB Ablehnung
05. Januar 2012 2012/5 Gaz SG Ablehnung
15. November 2011 2011/48 Gaz US Ablehnung
16. März 2011 KR Eintragung

ID: 141093207