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Die Internationale Marke FLEXWAVE wurde als Wortmarke am 27.01.2011 bei der Weltorganisation für geistiges Eigentum angemeldet.
| Markenform | Wortmarke |
| Aktenzeichen | 1071050 |
| Länder | 
|
| Basismarke |
Nr. 1218340,
27. Januar 2011
|
| Anmeldedatum | 27. Januar 2011 |
| Ablaufdatum | 27. Januar 2031 |
Markeninhaber
De Run 6501
5504 DR Veldhoven
NL
5504 DR Veldhoven
NL
Markenvertreter
Koninginnegracht 35
THE HAGUE
NL
Waren und Dienstleistungen
07
Machines for micro-lithography; machines not included in
other classes, for use in the field of electronics,
integrated circuits, semi-conductors, magnetic domain memory
and integrated optical systems; parts of all of the
aforementioned goods in the form of mirror and lens
assemblies for polarization purposes
09
Micro-lithography appliances; electronic apparatus and
instruments for use in the field of micro-lithography,
semi-conductors, integrated circuits, magnetic domain memory
and integrated optical systems (not included in other
classes); parts of all the aforementioned goods, namely
mirrors and lenses for polarization purposes; software for
use in the field of electronics, micro-lithography,
semi-conductors, integrated circuits, magnetic domain memory
and integrated optical systems namely software for
measurement and control of light sources and light
polarization processes; software for use in the design,
testing and manufacturing of photo-lithographic masks;
semi-conductors; integrated circuits; photo-lithographic
masks; magnetic heads, chips, gene chips, LCDs, display
screens, magnetic domain memories, integrated optical
systems
42
Technical consultancy (services of engineers) in the field
of machines, apparatus and instruments for use in
electronics, micro-lithography, semi-conductors, integrated
circuits, magnetic domain memories and integrated optical
systems industries; design, maintenance and development of
computer software for use in the field of electronics,
micro-lithography, semi-conductors, integrated circuits,
magnetic domain memories and integrated optical systems
industries and for the design, testing and manufacture of
photo-lithographic masks; consultancy in relation to the
aforementioned services
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 27. Januar 2021 | 2021/4 Gaz | Verlängerung | |
| 30. Januar 2013 | 2013/5 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 15. März 2012 | 2012/17 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 05. Januar 2012 | 2012/2 Gaz | KR | Ablehnung |
| 14. November 2011 | 2011/46 Gaz | CN | Ablehnung |
| 28. September 2011 | 2011/49 Gaz | SG | Ablehnung |
| 08. September 2011 | 2011/36 Gaz | JP | Ablehnung |
| 05. Mai 2011 | 2011/18 Gaz | US | Ablehnung |
| 27. Januar 2011 | 2011/13 Gaz | BX | Eintragung |
ID: 141071050