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Die Internationale Marke TeraPure wurde als Wortmarke am 05.03.2010 bei der Weltorganisation für geistiges Eigentum angemeldet.
| Markenform | Wortmarke |
| Aktenzeichen | 1046538 |
| Registernummer | 302009052838.1/07 |
| Länder | 
|
| Basismarke |
Nr. 30 2009 052 838.1/07,
14. Januar 2010
|
| Anmeldedatum | 05. März 2010 |
| Ablaufdatum | 05. März 2020 |
Markeninhaber
Schleissheimer Str. 90
85748 Garching
DE
85748 Garching
DE
Markenvertreter
Siebertstr. 3
81675 München
DE
Waren und Dienstleistungen
07
Machines and apparatuses and systems consisting thereof for
the manufacture of substrates, in particular semiconductor
substrates, hard discs, silicon discs, wafers, photo, hard
or embossing masks, templates, structured masks and
substrates for nanoimprint lithography; machines and systems
consisting thereof for the wet-chemical treatment of
substrates, in particular semiconductor substrates, hard
discs, silicon discs, wafers, photo, hard or embossing
masks, templates, structured masks and substrates for
nanoimprint lithography; fully automatic machines and
systems consisting thereof for cleaning, coating,
developing, etching and stripping of substrates, in
particular semiconductor substrates, hard discs, silicon
discs, wafers, photo, hard or embossing masks, templates,
structured masks and substrates for nanoimprint lithography;
machines and apparatuses and systems consisting thereof
(manual loading and unloading) for cleaning, coating,
developing, etching and stripping of substrates, machines
for the semiconductor or hard disc industry, including
machines for varnishing and coating of substrates, in
particular semiconductor substrates, hard discs, silicon
discs, wafers, photo, hard or embossing masks, templates,
structured masks and substrates for nanoimprint lithography,
machines for curing coatings and varnishes, machines for
cleaning of substrates, in particular semiconductor
substrates, hard discs, silicon discs, wafers, photo, hard
or embossing masks, templates, structured masks and
substrates for nanoimprint lithography, for the manufacture
of semiconductors or hard discs, machines for the inspection
of substrates and discs, machines for developing substrates,
machines for etching layers on substrates; handling and
automation components and systems, consisting in substance
of grippers, transport devices, conveyor devices, loading
and unloading devices, linear and pivoting devices (included
in this class); supply and treatment systems for liquids and
gases, consisting in substance of pumps (machine or engine
components), filters (as parts of machines), valves (as
parts of machines), metering machines; parts of the
aforementioned goods
37
Installation of the machines, apparatus, and systems
mentioned in class 7 to enable the proper execution of the
dry chemical and wet chemical as well as physical methods to
be run on the system; cleaning of surfaces of masks for the
production of semiconductors or hard disks and cleaning of
surfaces of semiconductor substrates, hard discs, silicon
discs, wafers, photo, hard or embossing masks, templates,
structured masks and substrates for nanoimprint lithography
by means of dry chemical and wet chemical as well as
physical methods and maintenance of the above goods
40
Machining or processing of materials, in particular,
preparing masks for the production of semiconductors or hard
disks and of semiconductor substrates, hard discs, silicon
discs, wafers, photo, hard or embossing masks, templates,
structured masks and substrates for nanoimprint lithography;
processing of materials, in particular lithographic
processing of substrates in particular by means of
nanoimprint lithography
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 08. Mai 2021 | 2021/18 Gaz | Löschung | |
| 28. Juni 2019 | 2019/46 Gaz | US | RAW: Total Invalidation |
| 10. September 2012 | 2012/42 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 23. Februar 2012 | 2012/8 Gaz | KR | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 23. Juni 2011 | 2013/6 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 22. April 2011 | 2011/17 Gaz | KR | Ablehnung |
| 09. Dezember 2010 | 2010/49 Gaz | JP | Ablehnung |
| 30. August 2010 | 2010/36 Gaz | US | Ablehnung |
| 05. März 2010 | 2010/32 Gaz | DE | Eintragung |
ID: 141046538