USPTOSchützen Sie diese Marke vor Nachahmern!
Mit unserer Markenüberwachung werden Sie automatisch per E-Mail über Nachahmer und Trittbrettfahrer benachrichtigt.
Die US-Marke TRITON wurde als Wortmarke am 28.02.2001 beim Amerikanischen Patent- und Markenamt angemeldet. Der aktuelle Status der Marke ist "ABANDONED - EXPRESS".
| Markenform | Wortmarke |
| Aktenzeichen | 76218315 |
| Anmeldedatum | 28. Februar 2001 |
Markeninhaber
Carl-Benz-Strasse 10
72124 Pliezhausen
DE
72124 Pliezhausen
DE
Markenvertreter
Waren und Dienstleistungen
7
Machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and solar cells; machines for drying, cleaning or etching silicon wafers for use in the in the manufacture of semiconductor chips; wet processing machines for use manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and machine parts, namely, drying units using nitrogen, alcohol vapors or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, and solar cells
11
Drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
37
Installation and servicing of the following machines and units, machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips, and/or solar cells, machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts; drying and wet processing units for the treatment of semiconductor substrates, silicon chips wafers, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
ID: 1376218315