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Semiconductor wafer stepper mechanisms, photolithographic and implanting mechanisms for producing images, and printing or implanting images on wafers and substrates for manufacturing semiconductor wafers and other substrates; reticles and masks for use with said semiconductor wafer stepper mechanisms, photolithographic and implanting mechanisms in manufacturing said semiconductors wafer and other substrates, wherein said reticles and masks contain the pattern to be printed on said semiconductor wafer and other substrates; specialized optical lenses, wafer, reticles and mask transport stage mechanisms and wafer index tooling mechanisms for use in manufacturing semiconductor wafers and other substrates; computer software for use in operating semiconductor wafer stepper mechanisms, photolithographic and implanting mechanisms for manufacturing semiconductor wafers and other substrates; and replacement parts therefor
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