STEAG MICROTECH

USPTO USPTO 1996 CANCELLED - SECTION 7

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Die US-Marke STEAG MICROTECH wurde als Wort-Bildmarke am 11.04.1996 beim Amerikanischen Patent- und Markenamt angemeldet.
Sie wurde am 21.04.1998 im Markenregister eingetragen. Der aktuelle Status der Marke ist "CANCELLED - SECTION 7".

Markendetails Letztes Update: 03. Mai 2018

Markenform Wort-Bildmarke
Aktenzeichen 75086758
Registernummer 2151702
Anmeldedatum 11. April 1996
Veröffentlichungsdatum 10. Februar 1998
Eintragungsdatum 21. April 1998

Markeninhaber

Carl-Benz-Strasse 10
Pliezhausen
DE

Markenvertreter

Waren und Dienstleistungen

7 mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells; drying and wet processing apparatus for treating semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor
37 installation and maintenance for others of the following items; mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells; drying and wet processing apparatus for treating semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor
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ID: 1375086758