ENEGIA

WIPO WIPO 2008

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The International trademark ENEGIA was filed as Word mark on 04/03/2008 at the World Intellectual Property Organization.

Trademark Details Last update: October 16, 2018

Trademark form Word mark
File reference 963493
Register number 242896
Countries em Japan South Korea Singapore United States of America (USA) Switzerland China Russia
Base trademark AT No. 242 896, January 17, 2008
Application date April 3, 2008
Expiration date April 3, 2018

Trademark owner

SEZ-Straße 1
A-9500 Villach
AT

Trademark representatives

351 California Street, Suite 550 San Francisco, CA 94104 US

goods and services

07 Machines for the manufacture of semiconductors and microelectronic semiconductor products, machines for processing semi-finished products for semiconductors and silicon wafers, machines for etching, cleaning, polishing, roughening and drying of semi-finished products for semiconductors
42 Technical planning and design of machines for the manufacture of semiconductors and microelectronic semiconductor products, and of machines for the processing of semi-finished parts of semiconductors and silicon wafers

Trademark history

Date Document number Area Entry
October 13, 2018 2018/41 Gaz Deletion
April 8, 2016 2017/11 Gaz US RAW: Total Invalidation
February 8, 2010 2010/8 Gaz EM RAW: Rule 18ter(2)(i) GP following a provisional refusal
June 16, 2009 2009/27 Gaz EM Rejection
May 7, 2009 2009/24 Gaz SG RAW: Protection Granted
April 14, 2009 2009/17 Gaz KR RAW: Protection Granted
January 15, 2009 2009/3 Gaz JP RAW: Protection Granted
April 3, 2008 2008/22 Gaz AT Registration

ID: 14963493