ATMOS

WIPO WIPO 2006

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The International trademark ATMOS was filed as Word mark on 12/05/2006 at the World Intellectual Property Organization.

Trademark Details Last update: September 6, 2021

Trademark form Word mark
File reference 917902
Register number 30635958.8/11
Countries European Community South Korea Singapore China
Base trademark DE No. 306 35 958.8/11, December 5, 2006
Application date December 5, 2006
Expiration date December 5, 2026

Trademark owner

Daimlerstr. 10
89160 Dornstadt
DE

Trademark representatives

Dority & Manning, P.A., Post Office Box 1449 US

goods and services

07 Machines for the treatment of substrates, semiconductor substrates, silicon discs and wafers for semiconductor chip manufacturing and for making semiconductor film or layer structures (expitaxial-reactors)
11 Apparatuses, devices, machines and systems consisting thereof for the thermal treatment of substrates, semiconductor substrates, silicon discs and wafers for the production of semiconductor chips; rapid heating apparatuses for the treatment and production of semiconductors, in particular on the basis of halogen lamps and arc lamps
37 Maintenance and installation of the goods mentioned above
42 Developing the goods mentioned above

Trademark history

Date Document number Area Entry
December 5, 2016 2016/50 Gaz Extension
April 5, 2016 2016/48 Gaz US RAW: Total Invalidation
February 12, 2009 2012/51 Gaz US Decision on opposition
January 9, 2009 2009/21 Gaz JP RAW: Second Part Fee Not Paid
October 22, 2008 2008/48 Gaz SG Decision on opposition
October 9, 2008 2012/50 Gaz JP Decision on opposition
July 29, 2008 2012/49 Gaz KR Decision on opposition
May 23, 2008 2009/35 Gaz EM Decision on opposition
March 5, 2008 2008/13 Gaz CN Rejection
January 15, 2008 2008/4 Gaz KR Rejection
January 10, 2008 2008/4 Gaz JP Rejection
October 19, 2007 2007/43 Gaz EM Rejection
May 16, 2007 2007/21 Gaz SG Rejection
May 9, 2007 2007/19 Gaz US Rejection
December 5, 2006 2007/14 Gaz DE Registration
Partial deletion

ID: 14917902