Lasertec Logo (WIPO, 26.10.2022)
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Die Internationale Marke Lasertec wurde als Bildmarke am 26.10.2022 bei der Weltorganisation für geistiges Eigentum angemeldet.
Logodesign (Wiener Klassifikation)
#Briefe, die eine besondere Form des Schreibens darstellen #Briefe in schweren Buchstaben
| Markenform | Bildmarke |
| Aktenzeichen | 1708262 |
| Registernummer | 6612845 |
| Länder | 
|
| Basismarke |
Nr. 6612845,
09. September 2022
|
| Anmeldedatum | 26. Oktober 2022 |
| Ablaufdatum | 26. Oktober 2032 |
Markeninhaber
2-10-1 Shin-yokohama,
Kohoku-ku, Yokohama-shi
JP
Kohoku-ku, Yokohama-shi
JP
Markenvertreter
HIBIKI IP Law Firm,
Asahi Bldg. 5th Floor,
JP
Waren und Dienstleistungen
07
Defect repairing machines for photomasks for semiconductors;
defect repairing machines for reticles for semiconductors;
defect repairing machines for wafers for semiconductors;
defect repairing machines for photomasks for flat panel
displays; defect repairing machines for photomask blanks for
flat panel displays
09
Semiconductor photomask inspection apparatus; analyzing
apparatus for defect of photomasks for semiconductors;
semiconductor photomask pattern inspection apparatus;
semiconductor photomask pattern measuring apparatus;
semiconductor photomask imaging apparatus; semiconductor
photomask phase-shift measuring apparatus; semiconductor
photomask transmittance measuring apparatus; apparatus and
instruments for measuring semiconductor photomask phase
shifting amount; semiconductor reticle inspection apparatus;
analyzing apparatus for defect of semiconductor reticles;
semiconductor reticle pattern inspection apparatus;
semiconductor reticle pattern measuring apparatus;
semiconductor reticle imaging apparatus; semiconductor wafer
inspection apparatus; semiconductor wafer measuring
apparatus; semiconductor wafer imaging apparatus;
semiconductor wafer edge inspection apparatus; analyzing
apparatus for defect of wafers for semiconductors;
semiconductor photomask blanks inspection apparatus;
semiconductor photomask blanks imaging apparatus; flat panel
display photomask inspection apparatus; flat panel display
photomask pattern inspection apparatus; flat panel display
photomask pattern measuring apparatus; flat panel display
photomask blanks inspection apparatus; pellicle inspection
apparatus for photomasks for flat panel displays; pellicle
mounting apparatus for photomasks for flat panel displays;
confocal microscopes; laser microscopes; optical apparatus
and instruments; measuring apparatus; computer peripheral
devices; inspection apparatus for semi-conductor materials
and elements; semi-conductor testing machines and
instruments; electron microscopes; detectors; material
testing instruments and machines; testing apparatus not for
medical purposes; precision measuring apparatus; data sets,
recorded or downloadable; computer software, recorded;
computer software applications, downloadable; computer
hardware; computer programs, downloadable; systems for
in-situ visualizing of electro-chemical reactions
Die Bezeichnungen wurden automatisch übersetzt. Übersetzung anzeigen
Markenhistorie
| Datum | Belegnummer | Bereich | Eintrag |
|---|---|---|---|
| 18. Juli 2023 | 2023/29 Gaz | EM | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| 21. Juni 2023 | 2023/25 Gaz | US | Ablehnung |
| 14. Februar 2023 | 2023/8 Gaz | EM | Ablehnung |
| 26. Oktober 2022 | 2023/1 Gaz | JP | Eintragung |
ID: 141708262