HYOSUNG Neochem Absolute Quality & Safety Logo (WIPO, 04/23/2021)
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The International trademark HYOSUNG Neochem Absolute Quality & Safety was filed as Figurative mark on 04/23/2021 at the World Intellectual Property Organization.
Logodesign (Wiener Klassifikation)
#Letters presenting a special form of writing #Colours #Series of letters presenting different forms of writing #Series of letters in different dimensions #Blue
| Trademark form | Figurative mark |
| File reference | 1599735 |
| Countries | 
|
| Base trademark |
No. ,
July 12, 2024
|
| Application date | April 23, 2021 |
| Expiration date | April 23, 2031 |
Trademark owner
119(Gongdeok-dong),
Mapo-daero,
KR
Mapo-daero,
KR
Trademark representatives
Oori Patent & Law Office,
5F. Sindo B/D, 11-4,
KR
goods and services
01
High purity mixture gas for cleaning semiconductor; high
purity nitrogen compounds for etching semiconductor; high
purity mixture gas for cleaning display; high purity NF3 for
cleaning display; special gas for chemical purposes used for
cleaning semiconductor equipment; mixture gas for use in the
manufacture of semiconductors; gas for processing
semiconductor; ultra high purity gas for use in the
manufacture of semiconductors; Nitron Fluorine Three (NF3);
high purity mixture gas for cleaning solar batteries;
special gas for chemical purposes; fluoride for cleaning
purposes; gas purifying preparations; degassing agents;
carbonic acid gas; chemical preparations for use in
industry; quenching fluids for use in metalworking;
detergents for metal surface (not including detergents for
household purposes); coolants; chemical compositions for
metal plating; inorganic industrial chemicals; oxides;
hydrates; alkalies; compressed air; organic industrial
chemicals; organic acids; argon; nitrogen; nitrogen
compounds; catalysts for use in chemical processes;
antifreeze; bromine for chemical purposes; chemical
sorbents; enzyme stabilizers; salts [chemical preparations];
bases [chemical preparations]; etchants for use in the
manufacture of semiconductors
40
Gas production services; gas processing services; gas
compression services; purification of gases; petroleum gas
liquefaction; treatment of hazardous gases; processing of
natural gas; refining of natural gas; processing and
assembly of semiconductors; polishing of semiconductor;
recycling of chemicals; natural gas liquefaction services;
processing of metal surface using industrial chemicals;
treatment and coating of metal surfaces; coating of metal
surfaces using physical vapor deposition or chemical vapor
deposition processes; mineral accurate treatment; chemical
treatment of liquids; organic accurate treatment; processing
of compounds; processing of chemicals
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| April 7, 2023 | 2023/18 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| October 6, 2022 | 2022/41 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| May 21, 2022 | 2022/27 Gaz | SG | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| April 21, 2022 | 2022/16 Gaz | JP | Rejection |
| April 20, 2022 | 2022/17 Gaz | MY | Rejection |
| February 11, 2022 | 2022/7 Gaz | DE | Rejection |
| January 13, 2022 | 2022/2 Gaz | US | Rejection |
| November 18, 2021 | 2021/49 Gaz | CN | Rejection |
| November 9, 2021 | 2021/45 Gaz | FR | Rejection |
| October 4, 2021 | 2021/40 Gaz | RU | Rejection |
| September 13, 2021 | 2021/37 Gaz | BX | Rejection |
| September 7, 2021 | 2021/37 Gaz | SG | Rejection |
| July 19, 2021 | 2021/31 Gaz | PH | Rejection |
| April 23, 2021 | 2021/24 Gaz | KR | Registration |
ID: 141599735