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The International trademark INPRIA was filed as Word mark on 06/22/2017 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1379848 |
| Countries | 
|
| Base trademark |
No. 87279930,
December 23, 2016
|
| Application date | June 22, 2017 |
| Expiration date | June 22, 2027 |
Trademark owner
Suite 203,
2001 NW Monroe
US
2001 NW Monroe
US
Trademark representatives
33 South Sixth Street, Suite 3950
Minneapolis MN 55402
US
goods and services
01
Photoresists in the nature of chemicals; solutions of
chemicals useful to form metal oxide thin films; solutions
of chemicals for deposition of metal oxide thin films for
use as hard mask layers; metal oxides for use in a
photoresist process, namely, solutions of metal oxides;
developers, namely, photoresist developers for use with
photoresists in the nature of chemicals; edge bead removers
in the nature of chemicals, namely, solutions to remove edge
beads generated in a photoresist process; underlayer
materials in the nature of chemicals, namely, chemical
compositions for use with photoresist patterning
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| December 18, 2018 | 2019/5 Gaz | US | RAW: Partial Ceasing Effect |
| November 19, 2018 | 2018/47 Gaz | KR | Rejection |
| July 19, 2018 | 2018/31 Gaz | JP | Rejection |
| July 16, 2018 | 2018/29 Gaz | BX | Rejection |
| June 22, 2017 | 2017/48 Gaz | US | Registration |
ID: 141379848