scia Systems

WIPO WIPO 2017

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Die Internationale Marke scia Systems wurde als Wortmarke am 26.04.2017 bei der Weltorganisation für geistiges Eigentum angemeldet.

Markendetails Letztes Update: 12. November 2021

Markenform Wortmarke
Aktenzeichen 1371537
Registernummer 302016111010
Länder China
Basismarke DE Nr. 30 2016 111 010, 17. Januar 2017
Anmeldedatum 26. April 2017
Ablaufdatum 26. April 2027

Markeninhaber

Clemens-Winkler-Straße 6c
09116 Chemnitz
DE

Markenvertreter

Grillparzerstr. 14 81675 München DE

Waren und Dienstleistungen

07 Installations, machines and machine tools for the processing of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material; installations, machines and machine tools for coating substrates by means of chemical or physical vapor deposition techniques; vacuum coating machines and installations; installations, machines and machine tools for the processing of substrates by means of ion beams; installations, namely machines and machine tools and holding devices for machine tools for the coating and etching of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material by means of ion beams; installations, machines and machine tools for the processing of optical components, in particular optical lenses and optical mirrors; installations, machines and machine tools for processing electronic components, in particular microelectronic components, chips and integrated circuits
09 Electrical apparatus, namely sputter equipment, electron beam installations and ion beam installations; measuring, signaling and checking (supervision) apparatus and instruments for machines and installations for the treating of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material; data processing equipment for machines and installations for the treating of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material; computers and computer software for machines and installations for the treating of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material; installations for producing ion beams; electrical and electronic control apparatus for ion beam etching; electrical power supply apparatus for ion beams; ionization apparatus for scientific or laboratory use; computer software for use in processing semiconductor wafers; semiconductor wafers and devices, in particular of microelectronic semiconductor apparatus
37 Installation of industrial machinery; maintenance of industrial machinery; repair of industrial machinery; installation, repair and maintenance of installations, machines and machine tools for the processing of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material; installation, maintenance and repair of ion beam installations and electron beam installations; installation, maintenance and repair of measuring, signaling and checking (supervision) apparatus and instruments for machines and installations for the treating of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material; installation of computers; maintenance of computers; repair of computers
40 Material treatment by means of ion beams; etching, in particular using ion beams; application of coatings using vacuum deposition techniques; treatment and processing of substrates in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material; treatment and processing of optical components; treatment and processing of electronic components
42 Engineering; design and development of industrial machinery and installations; design and development of installations, machines and machine tools for the processing of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material; design and development of ion beam installations; development of industrial processes; development of industrial processes for the treating of substrates, in particular substrates of semiconductor material, silicon, glass, metal, plastic or polymeric material
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Markenhistorie

Datum Belegnummer Bereich Eintrag
21. Mai 2018 2018/21 Gaz CN Ablehnung
26. April 2017 2017/41 Gaz DE Eintragung

ID: 141371537