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The International trademark FLEXWAVE was filed as Word mark on 01/27/2011 at the World Intellectual Property Organization.
| Trademark form | Word mark |
| File reference | 1071050 |
| Countries | 
|
| Base trademark |
No. 1218340,
January 27, 2011
|
| Application date | January 27, 2011 |
| Expiration date | January 27, 2031 |
Trademark owner
De Run 6501
5504 DR Veldhoven
NL
5504 DR Veldhoven
NL
Trademark representatives
Koninginnegracht 35
THE HAGUE
NL
goods and services
07
Machines for micro-lithography; machines not included in
other classes, for use in the field of electronics,
integrated circuits, semi-conductors, magnetic domain memory
and integrated optical systems; parts of all of the
aforementioned goods in the form of mirror and lens
assemblies for polarization purposes
09
Micro-lithography appliances; electronic apparatus and
instruments for use in the field of micro-lithography,
semi-conductors, integrated circuits, magnetic domain memory
and integrated optical systems (not included in other
classes); parts of all the aforementioned goods, namely
mirrors and lenses for polarization purposes; software for
use in the field of electronics, micro-lithography,
semi-conductors, integrated circuits, magnetic domain memory
and integrated optical systems namely software for
measurement and control of light sources and light
polarization processes; software for use in the design,
testing and manufacturing of photo-lithographic masks;
semi-conductors; integrated circuits; photo-lithographic
masks; magnetic heads, chips, gene chips, LCDs, display
screens, magnetic domain memories, integrated optical
systems
42
Technical consultancy (services of engineers) in the field
of machines, apparatus and instruments for use in
electronics, micro-lithography, semi-conductors, integrated
circuits, magnetic domain memories and integrated optical
systems industries; design, maintenance and development of
computer software for use in the field of electronics,
micro-lithography, semi-conductors, integrated circuits,
magnetic domain memories and integrated optical systems
industries and for the design, testing and manufacture of
photo-lithographic masks; consultancy in relation to the
aforementioned services
Trademark history
| Date | Document number | Area | Entry |
|---|---|---|---|
| January 27, 2021 | 2021/4 Gaz | Extension | |
| January 30, 2013 | 2013/5 Gaz | US | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| March 15, 2012 | 2012/17 Gaz | JP | RAW: Rule 18ter(2)(ii) GP following a provisional refusal |
| January 5, 2012 | 2012/2 Gaz | KR | Rejection |
| November 14, 2011 | 2011/46 Gaz | CN | Rejection |
| September 28, 2011 | 2011/49 Gaz | SG | Rejection |
| September 8, 2011 | 2011/36 Gaz | JP | Rejection |
| May 5, 2011 | 2011/18 Gaz | US | Rejection |
| January 27, 2011 | 2011/13 Gaz | BX | Registration |
ID: 141071050