USPTOProtect this trademark from copycats!
With our trademark monitoring alerts, you are automatically notified by email about copycats and free riders.
The US trademark VERSALOCK PHOTOMASK ETCHER II was filed as Word mark on 06/10/1998 at the U.S. Patent and Trademark Office. The current status of the mark is "ABANDONED-FAILURE TO RESPOND OR LATE RESPONSE".
| Trademark form | Word mark |
| File reference | 75499295 |
| Application date | June 10, 1998 |
| Publication date | January 4, 2000 |
Trademark owner
10050 16th Street North
33716 St. Petersburg
US
33716 St. Petersburg
US
Trademark representatives
goods and services
7
plasma etching and plasma deposition machines used in the fabrication of semiconductor devices and in the fabrication of related electronic components
ID: 1375499295