AZ

WIPO WIPO 2008

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The International trademark AZ was filed as Word mark on 10/28/2008 at the World Intellectual Property Organization.

Trademark Details Last update: May 1, 2020

Trademark form Word mark
File reference 986532
Countries South Korea Singapore China Germany
Base trademark US No. , July 6, 2024
Application date October 28, 2008
Expiration date October 28, 2028

Trademark owner

Frankfurter Str. 250
64293 Darmstadt
DE

goods and services

01 Ceramic precursor chemicals; chemicals for use in the manufacture of products and components for the electronic and semiconductor industry; active resist, namely, acid or alkali-resistant nonconducting coating used to protect desired portions of a circuit pattern from the action of the etchant in the manufacture of semiconductor devices
17 Insulating materials, namely, electrical insulating materials, insulating and protective interlayer dielectric materials and coatings for use in integrated circuits, semiconductor devices, computer disk drives and other computer hardware, and insulating film for use in the manufacture of semiconductors

Trademark history

Date Document number Area Entry
October 28, 2018 2018/46 Gaz Extension
April 13, 2010 2010/32 Gaz KR Rejection
April 8, 2010 2010/33 Gaz SG RAW: Rule 18ter(2)(ii) GP following a provisional refusal
September 24, 2009 2009/39 Gaz KR Rejection
August 25, 2009 2009/37 Gaz CN Rejection
March 27, 2009 2009/25 Gaz US RAW: Partial Ceasing Effect
March 2, 2009 2009/11 Gaz SG Rejection
October 28, 2008 2008/50 Gaz US Registration

ID: 14986532